Morphology and water resistance of mixed silane films of bis[3-(triethoxysilyl) propyl]tetrasulfide and bis-[trimethoxysilylpropyl]amine
Creators
- 1. Department of Chemical and Materials Engineering, University of Cincinnati, Cincinnati, OH 45221-0012 (United States)
- 2. Department 1811, Sandia National Laboratories, Albuquerque, NM 87185 (United States)
- 3. Manuel Lujan Jr. Neutron Scattering Center, Los Alamos National Laboratory, Los Alamos, NM 87585 (United States)
Description
Functional organosilanes are powerful interface-active agents that find applications as adhesion promoters as well as optical, dielectric and protective coatings. Bis-silanes are of particular interest because they are highly crosslinked leading to very robust films. In almost all applications, the water resistance of the films is a critical performance measure. Here we use neutron reflectivity to address the effect of bridging group on the hydrothermal response of bis-silane films prepared using bis[3-(triethoxysilyl) propyl]tetrasulfide and bis-[trimethoxysilylpropyl]amine. Neat and mixed films are examined as-prepared, after exposure to water vapor and then in the re-dried state. The bridging group is the key factor that controls the morphology and water resistance of silane films. Although bis-sulfur silane is not as condensed as bis-amino silane, bis-sulfur swells less in water because of the hydrophobic nature of bridging group. The reflectivity of bis-sulfur silane film is reversible after room-temperature water conditioning but not at 80 deg. C, indicating chemical alternation of the film at 80 deg. C. The water resistance of mixed silane is roughly that of both components weighted by their volume fraction. But based on the enhanced shrinkage that occurs following water-vapor conditioning of the mixed film, condensation is accelerated in the mixed silane. Regarding the precursor solution, bis-amino silane may act as a catalyst in the hydrolysis of bis-sulfur silane leading to more silanols in the solution and further condensation in the film. Variation in the structure normal to the substrate is also examined by swelling the film with d-nitrobenzene, a non-reacting swelling agent
Additional details
Identifiers
- DOI
- 10.1016/j.tsf.2006.05.034;
- PII
- S0040-6090(06)00667-5;
Publishing Information
- Journal Title
- Thin Solid Films
- Journal Volume
- 515
- Journal Issue
- 4
- Journal Page Range
- p. 2771-2780
- ISSN
- 0040-6090
- CODEN
- THSFAP
INIS
- Country of Publication
- Netherlands
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 38058266
- Subject category
- S36: MATERIALS SCIENCE;
- Descriptors DEI
- AMINES; CATALYSTS; CROSS-LINKING; DIELECTRIC MATERIALS; FILM CONDENSATION; FILMS; HYDROLYSIS; INTERFACES; MORPHOLOGY; ORGANIC SULFUR COMPOUNDS; PROTECTIVE COATINGS; REFLECTIVITY; SILANES; SWELLING; TEMPERATURE RANGE 0273-0400 K; WATER VAPOR
- Descriptors DEC
- CHEMICAL REACTIONS; COATINGS; DECOMPOSITION; DEFORMATION; FLUIDS; GASES; HYDRIDES; HYDROGEN COMPOUNDS; LYSIS; MATERIALS; OPTICAL PROPERTIES; ORGANIC COMPOUNDS; ORGANIC SILICON COMPOUNDS; PHYSICAL PROPERTIES; POLYMERIZATION; SILICON COMPOUNDS; SOLVOLYSIS; SURFACE PROPERTIES; TEMPERATURE RANGE; VAPOR CONDENSATION; VAPORS
Optional Information
- Copyright
- Copyright (c) 2006 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.