Published June 2010 | Version v1
Journal article

Electronic structure of W-doped VO2 thin films with giant metal-insulator transition investigated by hard x-ray core-level photoemission spectroscopy

  • 1. Osaka Univ., Inst. of Scientific and Industrial Research, Ibaraki, Osaka (Japan)
  • 2. National Inst. for Material Science, NIMS Beamline Station SPring-8, Sayo, Hyogo (Japan)

Description

We use bulk-sensitive hard X-ray core-level photoemission spectroscopy to investigate the electronic structure of 1 at. % W-doped VO2 (VWO) thin films exhibiting a high temperature coefficient of resistance, above -10%/K at room temperature. According to the W 4d core-level spectra, the chemical state of doped W takes only a 6+ valence state, which suggests the introduction of V3+. The satellite structure of the V 2p3/2 main peak, which corresponds to the metallic-coherent screened states, was enhanced for VWO compared with VO2 indicating that electron doping plays an important role in the control of metal-insulator transition. (author)

Availability note (English)

Available from http://dx.doi.org/10.1143/APEX.3.063201

Additional details

Identifiers

Publishing Information

Journal Title
Applied Physics Express
Journal Volume
3
Journal Issue
6
Journal Page Range
p. 063201.1-063201.3
ISSN
1882-0778

Optional Information

Notes
19 refs., 3 figs.