Intermixing in Al/Ti multilayer structures induced by nanosecond laser pulses
Creators
- 1. VINČA Institute of Nuclear Sciences, Laboratory for Atomic Physics, Belgrade University, PO Box 522, 11001 Belgrade (Serbia)
- 2. Jožef Stefan Institute, Jamova 39, 1000 Ljubljana (Slovenia)
- 3. Illmenau University of Technology, Ehrenbergstrasse 29, 98693 Illmenau (Germany)
Description
Structural and compositional modifications of multilayered Al/Ti nano-structures induced by nanosecond laser pulses were investigated. Five and ten (Al/Ti) bilayers, with total thicknesses of 130 and 260 nm, respectively, were deposited by dc ion sputtering onto (100) Si wafers. The structures were irradiated in air with nanosecond Nd:YAG unfocused laser pulses. Characterizations of the samples were performed by x-ray diffraction analysis, Auger electron spectroscopy, atomic force microscopy and transmission electron microscopy. It was found that laser treatment of both structures induced complete intermixing of all deposited metallic films, their mixing with silicon substrate and formation of Al–Ti intermetallic and silicide compounds. This effect was achieved even for one applied laser pulse. Comparing these results with that for picosecond laser treatment of similar multilayered structures, it was concluded that materials involved within the heat diffusion length participated in the formation of new phases. (paper)
Availability note (English)
Available from http://dx.doi.org/10.1088/0031-8949/2013/T157/014008Additional details
Identifiers
Publishing Information
- Journal Title
- Physica Scripta (Online)
- Journal Volume
- 2013
- Journal Issue
- T157
- Journal Page Range
- [6 p.]
- ISSN
- 1402-4896
INIS
- Country of Publication
- United Kingdom
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 46055562
- Subject category
- S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY;
- Descriptors DEI
- ALUMINIUM; ATOMIC FORCE MICROSCOPY; AUGER ELECTRON SPECTROSCOPY; COMPARATIVE EVALUATIONS; DIFFUSION LENGTH; FILMS; INTERFACES; IRRADIATION; LAYERS; NANOSTRUCTURES; NEODYMIUM LASERS; SILICIDES; SILICON; SPUTTERING; SUBSTRATES; THIN FILMS; TITANIUM; TRANSMISSION ELECTRON MICROSCOPY; X-RAY DIFFRACTION
- Descriptors DEC
- COHERENT SCATTERING; DIFFRACTION; DIMENSIONS; ELECTRON MICROSCOPY; ELECTRON SPECTROSCOPY; ELEMENTS; EVALUATION; FILMS; LASERS; LENGTH; METALS; MICROSCOPY; SCATTERING; SEMIMETALS; SILICON COMPOUNDS; SOLID STATE LASERS; SPECTROSCOPY; TRANSITION ELEMENTS