Published December 10, 2010 | Version v1
Journal article

Quantum well mobility and the effect of gate dielectrics in remote doped InSb/AlxIn1−xSb heterostructures

  • 1. QinetiQ, St Andrews Road, Malvern, Worcestershire WR14 3PS (United Kingdom)
  • 2. Department of Physics, Imperial College, Prince Consort Road, London SW7 2BZ (United Kingdom)
  • 3. Photon Science Institute, University of Manchester, Alan Turing Building, Manchester M13 9PL (United Kingdom)

Description

Low- and high-field magnetotransport measurements on 30 nm δ-doped InSb/AlInSb quantum wells with different doping densities are reported. Mobilities over the temperature range 2 to 290 K are described using the relaxation time approximation. Screening by electrons in the doping plane and the temperature variation of the Fermi wave vector and effective mass of the carriers are incorporated into the model. High quality, Shubnikov de Haas oscillations are observed in samples that exhibit single sub-band occupancy. However, higher density samples that show considerable parallel conductance with qualitatively poor ρxx(B) are shown to recover high quality Shubnikov de Haas oscillations by deposition of a surface gate with a SiO2 gate dielectric. We show that the incorporation of this gate dielectric significantly modifies the transport properties and results in an increased mobility over ungated structures with the same carrier density. These observations lead to further insight into the carrier scattering mechanisms present in these InSb/AlInSb structures

Availability note (English)

Available from http://dx.doi.org/10.1088/0268-1242/25/12/125005

Additional details

Identifiers

DOI
10.1088/0268-1242/25/12/125005;
PII
S0268-1242(10)59394-5;

Publishing Information

Journal Title
Semiconductor Science and Technology
Journal Volume
25
Journal Issue
12
Journal Page Range
[7 p.]
ISSN
0268-1242
CODEN
SSTEET