Published March 16, 2023
| Version v1
Miscellaneous
Molecular beam epitaxy and characterization of InAs-AlAsSb core-shell nanowires
Description
In the present work the growth of InAs-AlAsSb core-shell nanowires with ultrathin InAs core via molecular beam epitaxy on silicon is introduced. High yield and high aspect ratio InAs nanowires with diameters below 30 nm are presented. Further, the epitaxial overgrowth with AlAsSb including As fraction tunability is established. Finally, PL studies show a wide range of tunabilily for the InAs core emission.
Availability note (English)
Available from: https://mediatum.ub.tum.de/?id=1690551Additional details
Identifiers
Publishing Information
- ISBN
- 978-3-946379-47-8
- Imprint Pagination
- 183 p.
- Journal Volume
- 247
- Series
- Selected topics of semiconductor physics and technology
INIS
- Country of Publication
- Germany
- Country of Input or Organization
- Germany
- INIS RN
- 55022345
- Subject category
- S77: NANOSCIENCE AND NANOTECHNOLOGY; S36: MATERIALS SCIENCE;
- Resource subtype / Literary indicator
- Thesis, Non-conventional Literature
- Descriptors DEI
- ASPECT RATIO; EMISSION; INDIUM ARSENIDES; MOLECULAR BEAM EPITAXY; NANOWIRES
- Descriptors DEC
- ARSENIC COMPOUNDS; ARSENIDES; CRYSTAL GROWTH METHODS; DIMENSIONLESS NUMBERS; EPITAXY; INDIUM COMPOUNDS; NANOSTRUCTURES; PNICTIDES