Published January 26, 1979 | Version v1
Patent

Device for processing off-gas of uranium hexafluoride

Description

Purpose: To obtain a compact, low cost and reliable processing system. Constitution: In a device for processing uranium hexafluoride gas at a level lower than several-tens torr, a cold trap for collecting the uranium hexafluoride gas leaking from the device and a further device downstream thereof for processing the uranium hexafluoride gas issuing not collected in the above cold trap are provided. A rotary pump is provided downstream of the cold trap to elevate the pressure of the uranium hexafluoride gas issuing from the cold trap near atmospheric pressure. Then, the pressurized gas is introduced by way of pipelines to an adsorption tower where the uranium hexafluoride gas is collected. Fluorine oil, inert to the uranium hexafluoride, is used for the rotary pump. Elevation of the gas near the atmospheric pressure enables the use of recycling liquid having a high vapor pressure in the adsorption tower, as well as the use of solid adsorbents. (Ikeda, J.)

Availability note (English)

Available from JAPATIC. Also available from INPADOC.

Additional details

Publishing Information

Imprint Pagination
3 p.
IPC:
Int. Cl. G21F9/02.
IPC
Int. Cl. G21F9/02.
Patent number
JP patent document 54-10899/A/