Published August 2004
| Version v1
Journal article
Characteristics of a plasma sheath in a radio frequency biased voltage
Creators
- 1. State Key Laboratory of Materials Modification by Laser, Ion and Electron Beams, Dalian University of Technology, Dalian 116024 (China)
Description
The exact equations of a radio frequency (rf) sheath driven by rf-biased voltage are solved numerically. All of the sheath characteristics for an arbitrary rf frequency are obtained, including the time-dependent ion density distributions, the ion current density, and ion kinetic energy at the electrode. Moreover, the ion energy distributions (IEDs) impinging on the rf-biased electrode are calculated, which match the experiment result [M. A. Sobolewski, J. K. Olthoff, and Y. C. Wang, J. Appl. Phys. 85, 3966 (1999)] exactly. The results show that the rf frequency is a crucial parameter for determining the spatiotemporal characteristic and the shape of IEDs
Additional details
Identifiers
- DOI
- 10.1063/1.1764507;
Publishing Information
- Journal Title
- Physics of Plasmas
- Journal Volume
- 11
- Journal Issue
- 8
- Journal Page Range
- p. 3840-3844
- ISSN
- 1070-664X
- CODEN
- PHPAEN
INIS
- Country of Publication
- United States
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 36036523
- Subject category
- S70: PLASMA PHYSICS AND FUSION TECHNOLOGY;
- Descriptors DEI
- CURRENT DENSITY; ENERGY SPECTRA; HIGH-FREQUENCY DISCHARGES; ION DENSITY; IONS; PLASMA DENSITY; PLASMA SHEATH; PLASMA SIMULATION
- Descriptors DEC
- CHARGED PARTICLES; ELECTRIC DISCHARGES; SIMULATION; SPECTRA
Optional Information
- Notes
- (c) 2004 American Institute of Physics.