Published August 2004 | Version v1
Journal article

Characteristics of a plasma sheath in a radio frequency biased voltage

  • 1. State Key Laboratory of Materials Modification by Laser, Ion and Electron Beams, Dalian University of Technology, Dalian 116024 (China)

Description

The exact equations of a radio frequency (rf) sheath driven by rf-biased voltage are solved numerically. All of the sheath characteristics for an arbitrary rf frequency are obtained, including the time-dependent ion density distributions, the ion current density, and ion kinetic energy at the electrode. Moreover, the ion energy distributions (IEDs) impinging on the rf-biased electrode are calculated, which match the experiment result [M. A. Sobolewski, J. K. Olthoff, and Y. C. Wang, J. Appl. Phys. 85, 3966 (1999)] exactly. The results show that the rf frequency is a crucial parameter for determining the spatiotemporal characteristic and the shape of IEDs

Additional details

Identifiers

Publishing Information

Journal Title
Physics of Plasmas
Journal Volume
11
Journal Issue
8
Journal Page Range
p. 3840-3844
ISSN
1070-664X
CODEN
PHPAEN

INIS

Country of Publication
United States
Country of Input or Organization
International Atomic Energy Agency (IAEA)
INIS RN
36036523
Subject category
S70: PLASMA PHYSICS AND FUSION TECHNOLOGY;
Descriptors DEI
CURRENT DENSITY; ENERGY SPECTRA; HIGH-FREQUENCY DISCHARGES; ION DENSITY; IONS; PLASMA DENSITY; PLASMA SHEATH; PLASMA SIMULATION
Descriptors DEC
CHARGED PARTICLES; ELECTRIC DISCHARGES; SIMULATION; SPECTRA

Optional Information

Notes
(c) 2004 American Institute of Physics.