The effects of active chlorine on photooxidation of 2-methyl-2-butene
- 1. Department of Environmental Engineering Sciences, University of Florida, P.O. Box 116450, Gainesville, FL 32611 (United States)
- 2. Applied Research Associates, Inc., Tyndall AFB, FL (United States)
- 3. Air Force Research Laboratory, Airbase Technologies Division, Tyndall AFB, FL (United States)
Description
Active chlorine comprising hypochlorite (OCl-), hypochlorous acid (HOCl) and chlorine (Cl2) is the active constituent in bleach formulations for a variety of industrial and consumer applications. However, the strong oxidative reactivity of active chlorine can cause adverse effects on both human health and the environment. In this study, aerosolized Oxone (registered) [2KHSO5, KHSO4, K2SO4] with saline solution has been utilized to produce active chlorine (HOCl and Cl2). To investigate the impact of active chlorine on volatile organic compound (VOC) oxidation, 2-methyl-2-butene (MB) was photoirradiated in the presence of active chlorine using a 2-m3 Teflon film indoor chamber. The resulting carbonyl products produced from photooxidation of MB were derivatized with O-(2,3,4,5,6-pentafluorobenzyl) hydroxyamine hydrochloride (PFBHA) and analyzed using gas chromatograph-ion trap mass spectrometer (GC/ITMS). The photooxidation of MB in the presence of active chlorine was simulated with an explicit kinetic model using a chemical solver (Morpho) which included both Master Chemical Mechanism (MCM) and Cl radical reactions. The reaction rate constants of a Cl radical with MB and its oxidized products were estimated using a Structure-Reactivity Relationship method. Under dark conditions no effect of active chlorine on MB oxidation was apparent, whereas under simulated daylight conditions (UV irradiation) rapid MB oxidation was observed due to photo-dissociation of active chlorine. The model simulation agrees with chamber data showing rapid production of oxygenated products that are characterized using GC/ITMS. Ozone formation was enhanced when MB was oxidized in the presence of irradiated active chlorine and NOx. - Research highlights: → Photooxidation of 2-methyl-2-butene (MB) in the presence of active chlorine. → The impact of atmospheric active chlorine on O3 formation. → Gas phase product analysis of MB photooxidation. → Chamber studies of MB photooxidation. → Explicit kinetic model of MB photooxidation in the presence of active chlorine.
Availability note (English)
Available from http://dx.doi.org/10.1016/j.scitotenv.2011.03.038Additional details
Identifiers
- DOI
- 10.1016/j.scitotenv.2011.03.038;
- PII
- S0048-9697(11)00328-7;
Publishing Information
- Journal Title
- Science of the Total Environment
- Journal Volume
- 409
- Journal Issue
- 13
- Journal Page Range
- p. 2652-2661
- ISSN
- 0048-9697
- CODEN
- STENDL
INIS
- Country of Publication
- Netherlands
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 44100057
- Subject category
- S37: INORGANIC, ORGANIC, PHYSICAL AND ANALYTICAL CHEMISTRY; S54: ENVIRONMENTAL SCIENCES;
- Descriptors DEI
- BUTENES; CHLORINE; DERIVATIZATION; HYPOCHLOROUS ACID; MASS SPECTROMETERS; NITROGEN OXIDES; OXIDATION; OZONE; POTASSIUM SULFATES; REACTION KINETICS; REACTIVITY; TEFLON; ULTRAVIOLET RADIATION; VOLATILE MATTER
- Descriptors DEC
- ALKALI METAL COMPOUNDS; ALKENES; CHALCOGENIDES; CHEMICAL REACTIONS; CHLORINE COMPOUNDS; ELECTROMAGNETIC RADIATION; ELEMENTS; FLUORINATED ALIPHATIC HYDROCARBONS; HALOGEN COMPOUNDS; HALOGENATED ALIPHATIC HYDROCARBONS; HALOGENS; HYDROCARBONS; HYDROGEN COMPOUNDS; INORGANIC ACIDS; INORGANIC COMPOUNDS; KINETICS; MATERIALS; MATTER; MEASURING INSTRUMENTS; NITROGEN COMPOUNDS; NONMETALS; ORGANIC COMPOUNDS; ORGANIC FLUORINE COMPOUNDS; ORGANIC HALOGEN COMPOUNDS; ORGANIC POLYMERS; OXIDES; OXYGEN COMPOUNDS; PETROCHEMICALS; PETROLEUM PRODUCTS; PLASTICS; POLYETHYLENES; POLYMERS; POLYOLEFINS; POLYTETRAFLUOROETHYLENE; POTASSIUM COMPOUNDS; RADIATIONS; SPECTROMETERS; SULFATES; SULFUR COMPOUNDS; SYNTHETIC MATERIALS
Optional Information
- Copyright
- Copyright (c) 2011 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.