Published March 1, 2019 | Version v1
Journal article

Langmuir probe measurements of an RF driven high-density inductively coupled argon plasma

  • 1. School of Science, Changchun University of Science and Technology, Changchun (China)
  • 2. School of Electrical Engineering, Dalian University of Technology, Dalian (China)

Description

In this paper, a high-density inductively coupled argon plasma was generated by an RF power supply, and the plasma density, electron temperature, and plasma potential were measured by a Langmuir probe. It was found that the plasma density, electron temperature, and plasma potential along the quartz glass tube axial direction increased in the range of 0.37x1019-6.75x1019 m−3, 3.44-5.91 eV, and 11.92-20.09 V respectively, when the incident RF power increased from 3 kV to 8 kV at a gas pressure of 25 Pa. The maximum values of the plasma density and plasma potential appear in the position of coil center and the electron temperature in the coil region almost unchanged. (paper)

Availability note (English)

Available from http://dx.doi.org/10.1088/1755-1315/242/2/022043

Additional details

Publishing Information

Journal Title
IOP Conference Series: Earth and Environmental Science (Online)
Journal Volume
242
Journal Issue
2
Journal Page Range
[6 p.]
ISSN
1755-1315

Conference

Title
4. International Conference on Energy Equipment Science and Engineering
Dates
28-30 Dec 2018
Place
Xi'an (China)

INIS

Country of Publication
United Kingdom
Country of Input or Organization
International Atomic Energy Agency (IAEA)
INIS RN
53019757
Subject category
S70: PLASMA PHYSICS AND FUSION TECHNOLOGY;
Resource subtype / Literary indicator
Conference
Descriptors DEI
ARGON IONS; ELECTRON DENSITY; ELECTRON TEMPERATURE; LANGMUIR PROBE; PLASMA DENSITY; PLASMA POTENTIAL
Descriptors DEC
CHARGED PARTICLES; ELECTRIC POTENTIAL; ELECTRIC PROBES; IONS; PROBES