Published March 1, 2019
| Version v1
Journal article
Langmuir probe measurements of an RF driven high-density inductively coupled argon plasma
Creators
- 1. School of Science, Changchun University of Science and Technology, Changchun (China)
- 2. School of Electrical Engineering, Dalian University of Technology, Dalian (China)
Description
In this paper, a high-density inductively coupled argon plasma was generated by an RF power supply, and the plasma density, electron temperature, and plasma potential were measured by a Langmuir probe. It was found that the plasma density, electron temperature, and plasma potential along the quartz glass tube axial direction increased in the range of 0.37x1019-6.75x1019 m−3, 3.44-5.91 eV, and 11.92-20.09 V respectively, when the incident RF power increased from 3 kV to 8 kV at a gas pressure of 25 Pa. The maximum values of the plasma density and plasma potential appear in the position of coil center and the electron temperature in the coil region almost unchanged. (paper)
Availability note (English)
Available from http://dx.doi.org/10.1088/1755-1315/242/2/022043Additional details
Identifiers
Publishing Information
- Journal Title
- IOP Conference Series: Earth and Environmental Science (Online)
- Journal Volume
- 242
- Journal Issue
- 2
- Journal Page Range
- [6 p.]
- ISSN
- 1755-1315
Conference
- Title
- 4. International Conference on Energy Equipment Science and Engineering
- Dates
- 28-30 Dec 2018
- Place
- Xi'an (China)
INIS
- Country of Publication
- United Kingdom
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 53019757
- Subject category
- S70: PLASMA PHYSICS AND FUSION TECHNOLOGY;
- Resource subtype / Literary indicator
- Conference
- Descriptors DEI
- ARGON IONS; ELECTRON DENSITY; ELECTRON TEMPERATURE; LANGMUIR PROBE; PLASMA DENSITY; PLASMA POTENTIAL
- Descriptors DEC
- CHARGED PARTICLES; ELECTRIC POTENTIAL; ELECTRIC PROBES; IONS; PROBES