Published November 2003 | Version v1
Journal article

Spatially resolved mass spectrometric sampling of inductively coupled plasmas using a movable sampling orifice

  • 1. Inficon Incorporated, East Syracuse, New York 13057-97140 (United States)
  • 2. Performance Coatings Lab, PSCT, K1-5A67 1 Research Circle, GE, Niskayuna, New York 12309 (United States)
  • 3. Materials Science and Engineering and Institute for Research in Electronics and Applied Physics, University of Maryland, College Park, Maryland 20742 (United States)

Description

A quadrupole mass spectrometer equipped with a special sampling tube and positioned on a linear-motion table is shown to be capable of obtaining important information on the variation of the discharge properties with position. We measured signals obtained by post-ionization of species sampled from Ar and C2F6 high-density plasmas using electron ionization energies of 30 and 16 eV. The variation of the ion signal with position of the sampling orifice inside the reactor provides evidence of the spatial nonuniformity of the discharge and the processes that control these variations. For Ar discharges we show evidence of gas heating which produces a nonuniform radial distribution of the neutral species. The neutral species are depleted in the center of the discharge due to plasma heating. The neutral gas temperature that can be extracted from the variation in density is consistent with temperature measurements using spectroscopic probes. We also monitored the intensity of different fluorocarbon ions as a function of sampling position. We find that the fluorocarbon mass spectrometer signals show qualitatively different dependencies on sampling position. For instance, the CF2+ signal increases towards the center of the discharge and decreases towards the wall of the chamber, whereas the CF3+ signal shows a maximum near the reactor wall. The CF3+ signal also grows as the wall temperature increases, indicating production at the wall. The application of this setup to spatially resolved monitoring of etching and deposition processes is also described

Additional details

Identifiers

Publishing Information

Journal Title
Journal of Vacuum Science and Technology. A, Vacuum, Surfaces and Films
Journal Volume
21
Journal Issue
6
Journal Page Range
p. 1971-1977
ISSN
0734-2101
CODEN
JVTAD6

Optional Information

Notes
(c) 2003 American Vacuum Society.