Published September 7, 2015 | Version v1
Journal article

Electrical spin injection in modulation-doped GaAs from an in situ grown Fe/MgO layer

  • 1. Department of Physics, Korea University, Seoul 136-713 (Korea, Republic of)
  • 2. Center for Spintronics, Korea Institute of Science and Technology, Seoul 136-791 (Korea, Republic of)
  • 3. KU-KIST Graduate School of Converging Science and Technology, Korea University, Seoul 136-701 (Korea, Republic of)
  • 4. Department of Nanomaterials Science and Engineering, Korea University of Science and Technology, Daejeon 305-350 (Korea, Republic of)

Description

We study spin accumulation in n-doped GaAs that were electrically injected from Fe via MgO using three-terminal Hanle measurement. The Fe/MgO/GaAs structures were prepared in a cluster molecular beam epitaxy that did not require the breaking of the vacuum. We found the crystal orientation relationship of epitaxial structures Fe[100]//MgO[110]//GaAs[110] without evident defects at the interface. Control of depletion width and interface resistance by means of modulation doping improves spin injection, leading to enhanced spin voltage (ΔV) of 6.3 mV at 10 K and 0.8 mV even at 400 K. The extracted spin lifetime and spin diffusion length of GaAs are 220 ps and 0.77 μm, respectively, at 200 K. MgO tunnel barrier grown in situ with modulation doping at the interface appears to be promising for spin injection into GaAs

Additional details

Identifiers

Publishing Information

Journal Title
Applied Physics Letters
Journal Volume
107
Journal Issue
10
Journal Page Range
p. 102407-102407.5
ISSN
0003-6951
CODEN
APPLAB

Optional Information

Notes
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