Published November 29, 2017 | Version v1
Journal article

Study of the influence of gas flow on PECVD diamond growth: influence of the separate injection of gases

  • 1. Institut Jean Lamour, UMR 7198 CNRS-Université de Lorraine, 54011 Nancy (France)
  • 2. Laboratoire de Physique des Interfaces et des Couches Minces—LPICM (UMR 7647) CNRS—Ecole Polytechnique 91128 Palaiseau cedex (France)

Description

This study is a follow-up to previously published modeling work examining a bell jar microwave plasma CVD reactor operating at high pressure (Mesbahi et al 2013 J. Phys. D: Appl. Phys . 46 385502). In this paper, we present the influence of gas injection mode on flow structure, on the production and coupled transport of diamond growth key species, and on the resulting diamond growth. Several gas injection configurations have been tested and experimental results in terms of growth rate and thickness uniformity will be compared with numerical simulations. In this study, we found that direct injection of methane closer to the discharge allowed one to significantly increase the diamond growth rate. These results will be discussed using a non-dimensional analysis of the transport phenomena (mass, energy and momentum by convection and diffusion) and production of the CH3 radical in the reactor. (paper)

Availability note (English)

Available from http://dx.doi.org/10.1088/1361-6463/aa9167

Additional details

Identifiers

Publishing Information

Journal Title
Journal of Physics. D, Applied Physics
Journal Volume
50
Journal Issue
47
Journal Page Range
[11 p.]
ISSN
0022-3727
CODEN
JPAPBE