Design and Simulation of Electro-fabricated MEMS Microhotplate for Gas Sensor Applications
Creators
- 1. Nanoelectronics and MEMS Laboratory, National Electronics and Computer Technology Center (NECTEC), 112 Thailand Science Park, Phaholyothin Rd., Klong Luang, Pathumthani 12120 (Thailand)
Description
In this paper, we present the simulation results of a new MEMS micro-hotplate design for gas sensor applications. The structure is designed to be fabricated on a glass substrate by the low cost process including physical vapor deposition, photolithography, electroplating, and photoresist-sacrificed process. The electro-thermo-mechanical behaviors of the proposed structure have been simulated by CoventorWareTM. In the simulation, the effects of thickness of the NiCr heater layer temperature, mechanical deflection, stress, and power consumption are evaluated. The 3D simulation on results show that the temperature, displacement, stress and current density are pronounced at the center of the beam as desired. At the nominal sensor temperature of ∼400 deg. C, the power consumption and Mises stress are greatly reduced from 126 to 7 mW and 1280 to 472 MPa as the thickness decreases from 5 to 0.25 μm. In contrast, the compressive beam deflection is not monotonically increased as thickness increases and it is maximum at the thickness of ∼0.5 μm. Therefore, the simulation results indicate that the proposed design with 0.25 m-thick NiCr heater requires very low power consumption of 7 mW with low stress suitable and acceptable membrane deflection for gas sensor applications
Availability note (English)
Available online at http://stacks.iop.org/1742-6596/34/643/jpconf6_34_106.pdf or at the Web site for the Journal of Physics. Conference Series (Online) (ISSN 1742-6596) http://www.iop.org/Additional details
Identifiers
Publishing Information
- Journal Title
- Journal of Physics. Conference Series (Online)
- Journal Volume
- 34
- Journal Issue
- 1
- Journal Page Range
- p. 643-649
- ISSN
- 1742-6596
Conference
- Title
- International MEMS conference 2006
- Acronym
- iMEMS2006
- Dates
- 9-12 May 2006
- Place
- Singapore (Singapore)
INIS
- Country of Publication
- United Kingdom
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 37058577
- Subject category
- S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY;
- Resource subtype / Literary indicator
- Conference
- Descriptors DEI
- CHROMIUM; CURRENT DENSITY; DESIGN; ELECTROMECHANICS; ELECTROPLATING; GLASS; HEATERS; INTERMETALLIC COMPOUNDS; LAYERS; MEMBRANES; MICROSTRUCTURE; NICKEL; PHYSICAL VAPOR DEPOSITION; SIMULATION; STRESSES; SUBSTRATES; THICKNESS
- Descriptors DEC
- ALLOYS; DEPOSITION; DIMENSIONS; ELECTRODEPOSITION; ELECTROLYSIS; ELEMENTS; LYSIS; MECHANICS; METALS; PLATING; SURFACE COATING; TRANSITION ELEMENTS