Published April 1, 2006 | Version v1
Journal article

Design and Simulation of Electro-fabricated MEMS Microhotplate for Gas Sensor Applications

  • 1. Nanoelectronics and MEMS Laboratory, National Electronics and Computer Technology Center (NECTEC), 112 Thailand Science Park, Phaholyothin Rd., Klong Luang, Pathumthani 12120 (Thailand)

Description

In this paper, we present the simulation results of a new MEMS micro-hotplate design for gas sensor applications. The structure is designed to be fabricated on a glass substrate by the low cost process including physical vapor deposition, photolithography, electroplating, and photoresist-sacrificed process. The electro-thermo-mechanical behaviors of the proposed structure have been simulated by CoventorWareTM. In the simulation, the effects of thickness of the NiCr heater layer temperature, mechanical deflection, stress, and power consumption are evaluated. The 3D simulation on results show that the temperature, displacement, stress and current density are pronounced at the center of the beam as desired. At the nominal sensor temperature of ∼400 deg. C, the power consumption and Mises stress are greatly reduced from 126 to 7 mW and 1280 to 472 MPa as the thickness decreases from 5 to 0.25 μm. In contrast, the compressive beam deflection is not monotonically increased as thickness increases and it is maximum at the thickness of ∼0.5 μm. Therefore, the simulation results indicate that the proposed design with 0.25 m-thick NiCr heater requires very low power consumption of 7 mW with low stress suitable and acceptable membrane deflection for gas sensor applications

Availability note (English)

Available online at http://stacks.iop.org/1742-6596/34/643/jpconf6_34_106.pdf or at the Web site for the Journal of Physics. Conference Series (Online) (ISSN 1742-6596) http://www.iop.org/

Additional details

Publishing Information

Journal Title
Journal of Physics. Conference Series (Online)
Journal Volume
34
Journal Issue
1
Journal Page Range
p. 643-649
ISSN
1742-6596

Conference

Title
International MEMS conference 2006
Acronym
iMEMS2006
Dates
9-12 May 2006
Place
Singapore (Singapore)

INIS

Country of Publication
United Kingdom
Country of Input or Organization
International Atomic Energy Agency (IAEA)
INIS RN
37058577
Subject category
S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY;
Resource subtype / Literary indicator
Conference
Descriptors DEI
CHROMIUM; CURRENT DENSITY; DESIGN; ELECTROMECHANICS; ELECTROPLATING; GLASS; HEATERS; INTERMETALLIC COMPOUNDS; LAYERS; MEMBRANES; MICROSTRUCTURE; NICKEL; PHYSICAL VAPOR DEPOSITION; SIMULATION; STRESSES; SUBSTRATES; THICKNESS
Descriptors DEC
ALLOYS; DEPOSITION; DIMENSIONS; ELECTRODEPOSITION; ELECTROLYSIS; ELEMENTS; LYSIS; MECHANICS; METALS; PLATING; SURFACE COATING; TRANSITION ELEMENTS