Published March 1996 | Version v1
Journal article

The production of high-duty-cycle, high-yield beams of highly charged ions with an electron beam ion source

Creators

  • 1. J. R. Macdonald Laboratory, Department of Physics, Kansas State University, Manhattan, Kansas 66506-2604 (United States)

Description

High yields of highly charged ions are produced with electron beam ion sources (EBISs) operated in a batch or pulsed mode, yielding small duty cycles. An EBIS operated in a continuous, dc, or leaky mode can produce continuous, open-quote open-quote dc close-quote close-quote ion beams, although with substantially lower yields especially for the higher charge states. This article introduces the leaky batch mode and the dc batch mode of operation which combine the high duty cycles obtained with leaky or dc modes with the high yields of highly charged ions obtained with batch modes. The leaky batch mode produces ion beams with duty cycles as high as 90% with ion yields as high as 70% of the most efficient batch mode. The dc batch mode delivers constant intensity (dc) ion beams during 50% of the time with ion yields as high as 98% of the most efficient batch mode. When the dc batch mode is combined with the stretcher mode proposed by Becker, the dc batch mode will allow for dc ion beams of constant intensity with yields close to the most efficient batch mode. copyright 1996 American Institute of Physics

Additional details

Publishing Information

Journal Title
Review of Scientific Instruments
Journal Volume
67
Journal Issue
3
Journal Page Range
p. 892-894.
ISSN
0034-6748
CODEN
RSINAK

Conference

Title
6. international conference on ion sources.
Dates
10-16 Sep 1995.
Place
Whistler (Canada).

INIS

Country of Publication
United States
Country of Input or Organization
United States
INIS RN
27076506
Subject category
S71: CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSICS;
Resource subtype / Literary indicator
Conference
Descriptors DEI
CHARGE STATES; CONFINEMENT; ELECTRON BEAM ION SOURCES; ION BEAMS; IONIZATION; MULTICHARGED IONS; TRAPPING; YIELDS
Descriptors DEC
BEAMS; CHARGED PARTICLES; ION SOURCES; IONS

Optional Information

Secondary number(s)
CONF-9509125--.