The production of high-duty-cycle, high-yield beams of highly charged ions with an electron beam ion source
Creators
- 1. J. R. Macdonald Laboratory, Department of Physics, Kansas State University, Manhattan, Kansas 66506-2604 (United States)
Description
High yields of highly charged ions are produced with electron beam ion sources (EBISs) operated in a batch or pulsed mode, yielding small duty cycles. An EBIS operated in a continuous, dc, or leaky mode can produce continuous, open-quote open-quote dc close-quote close-quote ion beams, although with substantially lower yields especially for the higher charge states. This article introduces the leaky batch mode and the dc batch mode of operation which combine the high duty cycles obtained with leaky or dc modes with the high yields of highly charged ions obtained with batch modes. The leaky batch mode produces ion beams with duty cycles as high as 90% with ion yields as high as 70% of the most efficient batch mode. The dc batch mode delivers constant intensity (dc) ion beams during 50% of the time with ion yields as high as 98% of the most efficient batch mode. When the dc batch mode is combined with the stretcher mode proposed by Becker, the dc batch mode will allow for dc ion beams of constant intensity with yields close to the most efficient batch mode. copyright 1996 American Institute of Physics
Additional details
Publishing Information
- Journal Title
- Review of Scientific Instruments
- Journal Volume
- 67
- Journal Issue
- 3
- Journal Page Range
- p. 892-894.
- ISSN
- 0034-6748
- CODEN
- RSINAK
Conference
- Title
- 6. international conference on ion sources.
- Dates
- 10-16 Sep 1995.
- Place
- Whistler (Canada).
INIS
- Country of Publication
- United States
- Country of Input or Organization
- United States
- INIS RN
- 27076506
- Subject category
- S71: CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSICS;
- Resource subtype / Literary indicator
- Conference
- Descriptors DEI
- CHARGE STATES; CONFINEMENT; ELECTRON BEAM ION SOURCES; ION BEAMS; IONIZATION; MULTICHARGED IONS; TRAPPING; YIELDS
- Descriptors DEC
- BEAMS; CHARGED PARTICLES; ION SOURCES; IONS
Optional Information
- Secondary number(s)
- CONF-9509125--.