Published October 2010 | Version v1
Report

Inward Pinch of High-Z Impurity due to Atomic Processes in a Rotating Tokamak Plasma and the Effect of Radial Electric Field

  • 1. Japan Atomic Energy Agency, Naka, Ibaraki (Japan)
  • 2. Keio University, Yokohama, Kanagawa (Japan)

Description

Full text: The transport of high-Z impurity in a toroidally rotating tokamak plasma is investigated numerically and analytically. It is found that the inward pinch is driven by the atomic processes of ionization/recombination both in co- and ctr- rotating plasmas. This inward pinch is enhanced by the radial electric field. It is also found that the negative and positive radial electric fields cause the inward pinch and the outward movement (unpinch) of the high-Z impurity, respectively, under the influence of Coulomb collisions with the rotating background plasma. The pinch and the unpinch due to the radial electric field are as large as the inward pinch due to atomic processes in the case of large radial electric field. Therefore, the inward pinch due to atomic processes and the unpinch due to the radial electric field can be suppressed by each other in the co-rotation case, while the large inward pinch occurs in the ctr-rotation case. (author)

Part of:
23. IAEA Fusion Energy Conference. Book of Abstracts

Additional details

Publishing Information

Imprint Title
23. IAEA Fusion Energy Conference. Book of Abstracts
Imprint Pagination
637 p.
Journal Page Range
p. 285-286
Report number
IAEA-CN--180

Conference

Title
23. IAEA Fusion Energy Conference
Acronym
FEC 2010
Dates
11-16 Oct 2010
Place
Daejeon (Korea, Republic of)

INIS

Country of Publication
International Atomic Energy Agency (IAEA)
Country of Input or Organization
International Atomic Energy Agency (IAEA)
INIS RN
43040994
Subject category
S70: PLASMA PHYSICS AND FUSION TECHNOLOGY;
Resource subtype / Literary indicator
Conference
Descriptors DEI
ELECTRIC FIELDS; IONIZATION; PLASMA IMPURITIES; RECOMBINATION; ROTATING PLASMA; TOKAMAK DEVICES
Descriptors DEC
CLOSED PLASMA DEVICES; IMPURITIES; PLASMA; THERMONUCLEAR DEVICES

Optional Information

Secondary number(s)
THC--P4-12