An improvement to computational efficiency of the drain current model for double-gate MOSFET
Creators
- 1. TSRC, Institute of Microelectronics, School of Electronic Engineering and Computer Science, Peking University, Beijing 100871 (China)
- 2. Peking University Shenzhen SOC Key Laboratory, PKU-HKUST Shenzhen Institution, Shenzhen 518057 (China)
Description
As a connection between the process and the circuit design, the device model is greatly desired for emerging devices, such as the double-gate MOSFET. Time efficiency is one of the most important requirements for device modeling. In this paper, an improvement to the computational efficiency of the drain current model for double-gate MOSFETs is extended, and different calculation methods are compared and discussed. The results show that the calculation speed of the improved model is substantially enhanced. A two-dimensional device simulation is performed to verify the improved model. Furthermore, the model is implemented into the HSPICE circuit simulator in Verilog-A for practical application. (condensed matter: electronic structure, electrical, magnetic, and optical properties)
Availability note (English)
Available from http://dx.doi.org/10.1088/1674-1056/20/9/097304Additional details
Identifiers
Publishing Information
- Journal Title
- Chinese Physics. B
- Journal Volume
- 20
- Journal Issue
- 9
- Journal Page Range
- [4 p.]
- ISSN
- 1674-1056
INIS
- Country of Publication
- China
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 45015197
- Subject category
- S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY;
- Descriptors DEI
- CALCULATION METHODS; COMPARATIVE EVALUATIONS; DESIGN; EFFICIENCY; ELECTRIC CURRENTS; ELECTRONIC STRUCTURE; MATHEMATICAL MODELS; MOSFET; TWO-DIMENSIONAL CALCULATIONS; VELOCITY
- Descriptors DEC
- CURRENTS; EVALUATION; FIELD EFFECT TRANSISTORS; MOS TRANSISTORS; SEMICONDUCTOR DEVICES; TRANSISTORS