Published September 2011 | Version v1
Journal article

An improvement to computational efficiency of the drain current model for double-gate MOSFET

  • 1. TSRC, Institute of Microelectronics, School of Electronic Engineering and Computer Science, Peking University, Beijing 100871 (China)
  • 2. Peking University Shenzhen SOC Key Laboratory, PKU-HKUST Shenzhen Institution, Shenzhen 518057 (China)

Description

As a connection between the process and the circuit design, the device model is greatly desired for emerging devices, such as the double-gate MOSFET. Time efficiency is one of the most important requirements for device modeling. In this paper, an improvement to the computational efficiency of the drain current model for double-gate MOSFETs is extended, and different calculation methods are compared and discussed. The results show that the calculation speed of the improved model is substantially enhanced. A two-dimensional device simulation is performed to verify the improved model. Furthermore, the model is implemented into the HSPICE circuit simulator in Verilog-A for practical application. (condensed matter: electronic structure, electrical, magnetic, and optical properties)

Availability note (English)

Available from http://dx.doi.org/10.1088/1674-1056/20/9/097304

Additional details

Publishing Information

Journal Title
Chinese Physics. B
Journal Volume
20
Journal Issue
9
Journal Page Range
[4 p.]
ISSN
1674-1056