Published December 15, 2002 | Version v1
Journal article

Structural and electronic properties of thallium overlayers on the Si(111)-7x7 surface

  • 1. Department of Molecular and Material Sciences, Kyushu University, Kasuga, Fukuoka 816-8580 (Japan)
  • 2. Department of Physics, University of Seoul, Seoul 130-743 (Korea, Republic of)
  • 3. Supercomputing Center, KISTI, P.O.Box 122, Yusung, Taejon 305-600 (Korea, Republic of)
  • 4. IQUIPS, University of Seoul, Seoul 130-743 (Korea, Republic of)
  • 5. Physics Department and Basic Science Research Institute, Pohang University of Science and Technology, San 31 Hyoja Dong, Pohang 790-784 (Korea, Republic of)

Description

We have investigated atomic arrangements and their electronic properties of the well-ordered thallium overlayer structures formed on the Si(111)-7x7 surface. As for other trivalent atoms, Tl is found to form a well-defined √(3)x√(3) surface, indicating the absence of a so-called 'inert pair effect' considered only for Tl. Another well ordered 1x1 surface at 1.0 monolayer appears to be semiconducting in our angle-resolved photoemission spectra dominated by a unique dispersive surface band near the Fermi level. Our theoretical calculations using density-functional theory show that Tl adatoms occupy the T4 sites and saturate all the dangling bonds of surface Si atoms to make the surface semiconducting with a band gap of 0.34 eV. The filled surface band observed has been well reproduced in our band calculations

Additional details

Identifiers

Publishing Information

Journal Title
Physical Review. B, Condensed Matter and Materials Physics
Journal Volume
66
Journal Issue
23
Journal Page Range
p. 233312-233312.4
ISSN
1098-0121

Optional Information

Notes
(c) 2002 The American Physical Society