Published August 4, 2008
| Version v1
Journal article
Femtosecond laser-induced electronic plasma at metal surface
Creators
- 1. Department of Mechanical Engineering, University of California at Berkeley, Berkeley, California 94720 (United States)
Description
We develop a theoretical analysis to model plasma initiation at the early stage of femtosecond laser irradiation of metal surfaces. The calculation reveals that there is a threshold intensity for the formation of a microscale electronic plasma at the laser-irradidated metal surface. As the full width at half maximum of a laser pulse increases from 15 to 200 fs, the plasma formation threshold decreases by merely about 20%. The dependence of the threshold intensity on laser pulse width can be attributed to laser-induced surface electron emission, in particular due to the effect of photoelectric effect
Additional details
Identifiers
- DOI
- 10.1063/1.2966152;
Publishing Information
- Journal Title
- Applied Physics Letters
- Journal Volume
- 93
- Journal Issue
- 5
- Journal Page Range
- p. 051506-051506.3
- ISSN
- 0003-6951
- CODEN
- APPLAB
INIS
- Country of Publication
- United States
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 40006760
- Subject category
- S71: CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSICS; S70: PLASMA PHYSICS AND FUSION TECHNOLOGY; S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY;
- Descriptors DEI
- ELECTRON EMISSION; LASER RADIATION; PHOTOELECTRIC EFFECT; PLASMA; PLASMA PRODUCTION; PLASMA SIMULATION; PULSES
- Descriptors DEC
- ELECTROMAGNETIC RADIATION; EMISSION; RADIATIONS; SIMULATION
Optional Information
- Notes
- (c) 2008 American Institute of Physics