Published 1992 | Version v1
Book

Organometallic precursors to vanadium and titanium carbonitride

  • 1. CNRS Lab. de Chimie de Coordination, 205 Route de Narbonne, 31077 Toulouse Cedex (France)

Description

This paper reports on the syntheses, structural and thermoanalytical studies of two titanium complexes CpTiCl2N(SiMe3)2 and FTi[N(SiMe3)2]3 and one vanadium complex V(NEt2)4. CpTiCl2N(SiMe3)2 has been used in a hot wall CVD reactor as a precursor to titanium nitride. Thin films of typically 1 μm in thickness have been deposited at 600 degrees C on glass, silicon and tool steel. XPS analyses of the deposits show titanium carbonitride to be formed. The new FTi[N(SiMe3)2]3 complex can also be used as a precursor to titanium nitride. V(NEt2)4 led at 500 degrees C to the deposition of vanadium carbonitride characterized by XPS analysis. Films tended to contain excess free carbon

Additional details

Publishing Information

Publisher
Materials Research Society.
Imprint Place
Pittsburgh, PA (United States)
ISBN
1-55899-166-2
Imprint Title
Proceedings of better ceramics through chemistry V
Imprint Pagination
969 p.
Journal Page Range
p. 875-880.

Conference

Title
1992 Material Research Society (MRS) spring meeting.
Dates
27 Apr - 2 May 1992.
Place
San Francisco, CA (United States).

Optional Information

Secondary number(s)
CONF-920402--.