Published 2019 | Version v1
Journal article

A Two-Dimensional MoS2 Catalysis Transistor by Solid-State Ion Gating Manipulation and Adjustment (SIGMA)

  • 1. Stanford University, Stanford, CA (United States). Dept. of Electrical Engineering
  • 2. SLAC National Accelerator Laboratory, Menlo Park, CA (United States). SUNCAT Center for Interface Science and Catalysis
  • 3. Stanford University, Stanford, CA (United States). SUNCAT Center for Interface Science and Catalysis
  • 4. Stanford University, Stanford, CA (United States). Dept. of Materials Science and Engineering

Description

A variety of methods including tuning chemical compositions, structures, crystallinity, defects and strain, and electrochemical intercalation have been demonstrated to enhance the catalytic activity. However, none of these tuning methods provide direct dynamical control during catalytic reactions. Here we propose a new method to tune the activity of catalysts through solid-state ion gating manipulation and adjustment (SIGMA) using a catalysis transistor. SIGMA can electrostatically dope the surface of catalysts with a high electron concentration over 5 × 1013 cm–2 and thus modulate both the chemical potential of the reaction intermediates and their electrical conductivity. The hydrogen evolution reaction (HER) on both pristine and defective MoS2 were investigated as model reactions. Furthermore, our theoretical and experimental results show that the overpotential at 10 mA/cm2 and Tafel slope can be in situ, continuously, dynamically, and reversibly tuned over 100 mV and around 100 mV/dec, respectively.

Availability note (English)

Available from https://www.osti.gov/servlets/purl/1576953; https://www.osti.gov/biblio/1576953; DOE Accepted Manuscript full text, or the publishers Best Available Version will be available free of charge after the embargo period

Additional details

Publishing Information

Journal Title
Nano Letters
Journal Volume
19
Journal Issue
10
Journal Page Range
p. 7293-7300
ISSN
1530-6984

Optional Information