Published March 2004 | Version v1
Journal article

Plotting algorithm of concentration profiles during sputtering of multilayer structure

  • 1. NAN Ukrainy, Inst. Metallofiziki im. G.V. Kurdyumova, Kiev (Ukraine)

Description

The inverse coagulation algorithm for plotting the concentration profiles by the ion sputtering of the multilayer thin film structures is developed. The method of the arbitrary gradient was used thereby with an account of the prior information on the character of the concentration profile monotony. It is established that such a mathematical treatment makes it possible to essentially decrease the distortions in the real form of the concentration profile

Abstract (Russian)

Разработан алгоритм обратной свертки построения концентрационных профилей при ионном распылении многослойных тонкопленочных структур. При этом использован метод условного градиента с учетом априорной информации о характере монотонности концентрационного профиля. Установлено, что такая математическая обработка позволяет существенно уменьшить искажения истинной формы концентрационного профиля

Additional details

Additional titles

Original title (Russian)
Алгоритм построения концентрационных профилей при ионном распылении многослойных структур

Publishing Information

Journal Title
Izvestiya Akademii Nauk. Rossijskaya Akademiya Nauk. Seriya Fizicheskaya
Journal Volume
68
Journal Issue
3
Journal Page Range
p. 400-402
ISSN
1026-3489
CODEN
IRAFEO

Conference

Title
16. International conference on ion-surface interaction (ISI-2003)
Original Conference Title
XVI Mezhdunarodnaya konferentsiya: vzaimodejstvie ionov s poverkhnost'yu VIP-2003
Dates
Aug 2003
Place
Zvenigorod (Russian Federation)

INIS

Country of Publication
Russian Federation
Country of Input or Organization
Russian Federation
INIS RN
36037870
Subject category
S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY;
Resource subtype / Literary indicator
Conference
Descriptors DEI
ALGORITHMS; IONS; LAYERS; SPUTTERING; TD-NICKEL CHROMIUM
Descriptors DEC
ALLOYS; CERMETS; CHARGED PARTICLES; CHROMIUM ALLOYS; COMPOSITE MATERIALS; DISPERSIONS; MATERIALS; MATHEMATICAL LOGIC; NICKEL ALLOYS; NICKEL BASE ALLOYS; TRANSITION ELEMENT ALLOYS

Optional Information

Notes
9 refs., 2 figs.