Published March 2004
| Version v1
Journal article
Plotting algorithm of concentration profiles during sputtering of multilayer structure
- 1. NAN Ukrainy, Inst. Metallofiziki im. G.V. Kurdyumova, Kiev (Ukraine)
Description
The inverse coagulation algorithm for plotting the concentration profiles by the ion sputtering of the multilayer thin film structures is developed. The method of the arbitrary gradient was used thereby with an account of the prior information on the character of the concentration profile monotony. It is established that such a mathematical treatment makes it possible to essentially decrease the distortions in the real form of the concentration profile
Abstract (Russian)
Разработан алгоритм обратной свертки построения концентрационных профилей при ионном распылении многослойных тонкопленочных структур. При этом использован метод условного градиента с учетом априорной информации о характере монотонности концентрационного профиля. Установлено, что такая математическая обработка позволяет существенно уменьшить искажения истинной формы концентрационного профиляAdditional details
Additional titles
- Original title (Russian)
- Алгоритм построения концентрационных профилей при ионном распылении многослойных структур
Publishing Information
- Journal Title
- Izvestiya Akademii Nauk. Rossijskaya Akademiya Nauk. Seriya Fizicheskaya
- Journal Volume
- 68
- Journal Issue
- 3
- Journal Page Range
- p. 400-402
- ISSN
- 1026-3489
- CODEN
- IRAFEO
Conference
- Title
- 16. International conference on ion-surface interaction (ISI-2003)
- Original Conference Title
- XVI Mezhdunarodnaya konferentsiya: vzaimodejstvie ionov s poverkhnost'yu VIP-2003
- Dates
- Aug 2003
- Place
- Zvenigorod (Russian Federation)
INIS
- Country of Publication
- Russian Federation
- Country of Input or Organization
- Russian Federation
- INIS RN
- 36037870
- Subject category
- S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY;
- Resource subtype / Literary indicator
- Conference
- Descriptors DEI
- ALGORITHMS; IONS; LAYERS; SPUTTERING; TD-NICKEL CHROMIUM
- Descriptors DEC
- ALLOYS; CERMETS; CHARGED PARTICLES; CHROMIUM ALLOYS; COMPOSITE MATERIALS; DISPERSIONS; MATERIALS; MATHEMATICAL LOGIC; NICKEL ALLOYS; NICKEL BASE ALLOYS; TRANSITION ELEMENT ALLOYS
Optional Information
- Notes
- 9 refs., 2 figs.