Crystallographic analysis using an electron beam and X-ray beam

Electron beams and X-ray are used in many types of analysis, and in particular, the techniques of using a transmission electron microscope (TEM) to observe microscope structures and of using X-ray diffraction (XRD) for crystallographic analysis are indispensable for product development. As high performance and high quality of products, analysis of smaller areas and thinner films is being necessary is required, and the combination of multiple analysis techniques is effective solve such difficult problems. This paper describes the example of crystallographic analysis of magnetic recording media and a SiC epitaxial layer using both TEM and synchrotron radiation XRD. (author)