Plasma control device

In the device of the present invention, the position and the shape of plasmas are controlled effectively while maintaining a main current flowing in poloidal magnetic field coils. Namely, the device comprises (1) a controlling power source for supplying a main current to poloidal magnetic field coils by way of an auxiliary inductor for maintaining the position and the shape of plasmas and (2) a control means for controlling variable minute current supplied from the controlling power source so that the position and the shape of the plasmas attain aimed values. The controlling power source directly drives the poloidal magnetic field coils. The power source of the poloidal magnetic field coil drives the poloidal magnetic field coils by way of the auxiliary inductor. Namely, the main current is supplied from the power source of the poloidal magnetic field coils and the minute variable current is supplied from the controlling power source. An ampere turn is supplied from the side of auxiliary windings and a working point of the main windings is made variable by changing the working point. (I.S.)