Published June 13, 1978 | Version v1
Patent Open

Apparatus for growing HgI2 crystals

Description

A method and horizontal furnace for vapor phase growth of HgI2 crystals which utilizes controlled axial and radial airflow to maintain the desired temperature gradients. The ampoule containing the source material is rotated while axial and radial air tubes are moved in opposite directions during crystal growth to maintain a desired distance and associated temperature gradient with respect to the growing crystal, whereby the crystal interface can advance in all directions, i.e., radial and axial according to the crystallographic structure of the crystal. Crystals grown by this method are particularly applicable for use as room-temperature nuclear radiation detectors

Availability note (English)

MF available from INIS under the Report Number.

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Additional details

Additional titles

Augmented title (English)
Patent

Publishing Information

Imprint Pagination
6 p.
IPC:
Int. Cl.B01J17/30; C01G13/04.
IPC
Int. Cl.B01J17/30; C01G13/04.
Patent number
US patent document 4,094,268/A/

INIS

Country of Publication
United States
Country of Input or Organization
United States
INIS RN
10468841
Subject category
S37: INORGANIC, ORGANIC, PHYSICAL AND ANALYTICAL CHEMISTRY;
Descriptors DEI
CRYSTAL GROWTH; FURNACES; MEDIUM TEMPERATURE; MERCURY IODIDES; RADIATION DETECTORS; SPECIFICATIONS
Descriptors DEC
HALIDES; HALOGEN COMPOUNDS; IODIDES; IODINE COMPOUNDS; MEASURING INSTRUMENTS; MERCURY COMPOUNDS

Optional Information

Notes
PAT-APPL-782,875.