Oxygen plasma assisted end-opening and field emission enhancement in vertically aligned multiwall carbon nanotubes
Creators
- 1. NIBEC, School of Engineering, University of Ulster, Jordanstown, BT37 0QB (United Kingdom)
- 2. Department of Mechanical Engineering, University of Alberta, Edmonton, T6T 2G8 (Canada)
- 3. Department of Physics, IIT Bombay, Powai, Mumbai-400076 (India)
- 4. School of Physics, University of the Witwatersrand, WITS 2050, Johannesburg (South Africa)
Description
Highlights: ► We showed Ar/O2 plasma can be effective for the end opening of aligned CNTs. ► The field emission property was dramatically enhanced after plasma modification. ► Microstructures were clearly understood by Raman and SEM analysis. ► Surface wet-ability at various functionalised conditions was studied. - Abstract: This paper highlights the changes in micro-structural and field emission properties of vertically aligned carbon nanotubes (VACNTs) via oxygen plasma treatment. We find that exposure of very low power oxygen plasma (6 W) at 13.56 MHz for 15–20 min, opens the tip of vertically aligned CNTs. Scanning electron microscopy and transmission electron microscopy images were used to identify the quality and micro-structural changes of the nanotube morphology and surfaces. Raman spectra showed that the numbers of defects were increased throughout the oxygen plasma treatment process. In addition, the hydrophobic nature of the VACNTs is altered significantly and the contact angle decreases drastically from 110° to 40°. It was observed that the electron field emission (EFE) characteristics are significantly enhanced. The turn-on electric field (ETOE) of CNTs decreased from ∼0.80 V μm−1 (untreated) to ∼0.60 V μm−1 (oxygen treated). We believe that the open ended VACNTs would be immensely valuable for applications such as micro/nanofluidic based filtering elements and display devices.
Availability note (English)
Available from http://dx.doi.org/10.1016/j.matchemphys.2012.03.012Additional details
Identifiers
- DOI
- 10.1016/j.matchemphys.2012.03.012;
- PII
- S0254-0584(12)00253-2;
Publishing Information
- Journal Title
- Materials Chemistry and Physics
- Journal Volume
- 134
- Journal Issue
- 1
- Journal Page Range
- p. 425-429
- ISSN
- 0254-0584
- CODEN
- MCHPDR
INIS
- Country of Publication
- Netherlands
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 44020925
- Subject category
- S77: NANOSCIENCE AND NANOTECHNOLOGY;
- Descriptors DEI
- CARBON; ELECTRIC FIELDS; ETCHING; FIELD EMISSION; MHZ RANGE; MICROSTRUCTURE; MODIFICATIONS; MORPHOLOGY; NANOTUBES; OXYGEN; PLASMA; RAMAN SPECTRA; RAMAN SPECTROSCOPY; SCANNING ELECTRON MICROSCOPY; SURFACE PROPERTIES; SURFACES; TRANSMISSION ELECTRON MICROSCOPY
- Descriptors DEC
- ELECTRON MICROSCOPY; ELEMENTS; EMISSION; FREQUENCY RANGE; LASER SPECTROSCOPY; MICROSCOPY; NANOSTRUCTURES; NONMETALS; SPECTRA; SPECTROSCOPY; SURFACE FINISHING
Optional Information
- Copyright
- Copyright (c) 2012 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.