Published May 15, 2012 | Version v1
Journal article

Oxygen plasma assisted end-opening and field emission enhancement in vertically aligned multiwall carbon nanotubes

  • 1. NIBEC, School of Engineering, University of Ulster, Jordanstown, BT37 0QB (United Kingdom)
  • 2. Department of Mechanical Engineering, University of Alberta, Edmonton, T6T 2G8 (Canada)
  • 3. Department of Physics, IIT Bombay, Powai, Mumbai-400076 (India)
  • 4. School of Physics, University of the Witwatersrand, WITS 2050, Johannesburg (South Africa)

Description

Highlights: ► We showed Ar/O2 plasma can be effective for the end opening of aligned CNTs. ► The field emission property was dramatically enhanced after plasma modification. ► Microstructures were clearly understood by Raman and SEM analysis. ► Surface wet-ability at various functionalised conditions was studied. - Abstract: This paper highlights the changes in micro-structural and field emission properties of vertically aligned carbon nanotubes (VACNTs) via oxygen plasma treatment. We find that exposure of very low power oxygen plasma (6 W) at 13.56 MHz for 15–20 min, opens the tip of vertically aligned CNTs. Scanning electron microscopy and transmission electron microscopy images were used to identify the quality and micro-structural changes of the nanotube morphology and surfaces. Raman spectra showed that the numbers of defects were increased throughout the oxygen plasma treatment process. In addition, the hydrophobic nature of the VACNTs is altered significantly and the contact angle decreases drastically from 110° to 40°. It was observed that the electron field emission (EFE) characteristics are significantly enhanced. The turn-on electric field (ETOE) of CNTs decreased from ∼0.80 V μm−1 (untreated) to ∼0.60 V μm−1 (oxygen treated). We believe that the open ended VACNTs would be immensely valuable for applications such as micro/nanofluidic based filtering elements and display devices.

Availability note (English)

Available from http://dx.doi.org/10.1016/j.matchemphys.2012.03.012

Additional details

Identifiers

DOI
10.1016/j.matchemphys.2012.03.012;
PII
S0254-0584(12)00253-2;

Publishing Information

Journal Title
Materials Chemistry and Physics
Journal Volume
134
Journal Issue
1
Journal Page Range
p. 425-429
ISSN
0254-0584
CODEN
MCHPDR

Optional Information

Copyright
Copyright (c) 2012 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.