Published October 1995 | Version v1
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Partial-depth modulation study of anions and neutrals in low pressure silane plasmas

  • 1. Ecole Polytechnique Federale, Lausanne (Switzerland). Centre de Recherche en Physique des Plasma (CRPP)

Description

Partial-depth modulation of the rf power in a capacitive discharge is used to investigate the relative importance of negative ions and neutral radicals for particle formation in low power, low pressure silane plasmas. For less than 85% modulation depth, anions are trapped indefinitely in the plasma and particle formation ensues, whereas the polymerised neutral flux magnitudes and dynamics are independent of the modulation depth and the powder formation. These observations suggest that negative ions could be the particle precursors in plasma conditions where powder appears many seconds after plasma ignition. Microwave interferometry and mass spectrometry were combined to infer an anion density of ≅7.109 cm-3 which is approximately twice the free electron density in these modulated plasmas. (author) 6 figs., tabs., refs

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MF available from INIS under the Report Number.

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Additional details

Publishing Information

Imprint Pagination
19 p.
Report number
LRP--530/95

INIS

Country of Publication
Switzerland
Country of Input or Organization
Switzerland
INIS RN
27011744
Subject category
S71: CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSICS;
Resource subtype / Literary indicator
Numerical Data
Descriptors DEI
ANIONS; EXPERIMENTAL DATA; LOW PRESSURE; MODULATION; NEUTRAL PARTICLES; PLASMA; POWDERS; RF SYSTEMS; SILANES; TRAPPING
Descriptors DEC
CHARGED PARTICLES; DATA; HYDRIDES; HYDROGEN COMPOUNDS; INFORMATION; IONS; NUMERICAL DATA; SILICON COMPOUNDS