Influence Of Ultrasonic Waves On The Formation Of High Pores Silicon Carbide
- 1. Physics Dept. University of Tadulako (Indonesia)
- 2. Physics Dept. University of Indonesia (Indonesia)
Description
The Challenge to produce a quality Silicon Carbide that combination high surface area is promising and this material can be used in many application such as Hydrogen storage materials. Synthesis of high surface area carbon materials by selective etching of Silicon Carbide with choric acid while exposing ultrasonic wave have been made.Powder Of Sic (surface area 17.8 m2/g) was treated in the chloric acetic as well as their mixture of various compositions and various time exposure of ultrasonic waves. Surface area and pore size can be controlled by temperature and concentration composition of Chloric and time exposure of ultrasonic wave.The resultant carbon and carbon-silicon carbide composite powders were characterized X-ray diffraction and Electron microscope. To determine a conversion degree of silicon carbide due to influence of the ultrasonic wave, the samples were annealed in open air at 1000 deg. C. There by carbon component of the carbon/silicon carbide composite was completely oxidized. The analysis of the samples shows the strong influence of time exposure of ultrasonic waves on the formation of pores.
Additional details
Identifiers
- DOI
- 10.1063/1.3243246;
Publishing Information
- Journal Title
- AIP Conference Proceedings
- Journal Volume
- 1169
- Journal Issue
- 1
- Journal Page Range
- p. 161-166
- ISSN
- 0094-243X
- CODEN
- APCPCS
Conference
- Title
- International workshop on advanced material for new and renewable energy
- Dates
- 9-11 Jun 2009
- Place
- Jakarta (Indonesia)
INIS
- Country of Publication
- United States
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 41064039
- Subject category
- S36: MATERIALS SCIENCE; S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY;
- Resource subtype / Literary indicator
- Conference
- Descriptors DEI
- ANNEALING; CARBON; COMPOSITE MATERIALS; ETCHING; HYDROGEN STORAGE; MIXTURES; POROUS MATERIALS; POWDERS; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTOR MATERIALS; SILICON CARBIDES; SURFACE AREA; SYNTHESIS; ULTRASONIC WAVES; X-RAY DIFFRACTION
- Descriptors DEC
- CARBIDES; CARBON COMPOUNDS; COHERENT SCATTERING; DIFFRACTION; DISPERSIONS; ELECTRON MICROSCOPY; ELEMENTS; HEAT TREATMENTS; MATERIALS; MICROSCOPY; NONMETALS; SCATTERING; SILICON COMPOUNDS; SOUND WAVES; STORAGE; SURFACE FINISHING; SURFACE PROPERTIES
Optional Information
- Notes
- (c) 2009 American Institute of Physics