Published March 1996 | Version v1
Journal article

Surface-wave sustained plasmas: Toward a better understanding of RF and microwave discharges

  • 1. Groupe de physique des plasmas, Universite de Montreal, Montreal H3C 3J7, Quebec (Canada)
  • 2. Centro de Electrodinamica da Universidade Tecnica de Lisboa, Instituto Superior Tecnico, Lisboa 1000 (Portugal)
  • 3. Polish Academy of Sciences, IMP-PAN, 80-952 Gdansk (Poland)

Description

An approach is presented that unifies the description of the various existing RF and microwave discharges. It is based on two essential facts: (i) it is not the spatial distribution of the high frequency (HF) electric field intensity but its spatial average that plays in the power transfer to the plasma; (ii) the power θ required to maintain an electron in the discharge is governed by charged particle losses, which are independent of the HF E-field. This enables one to model separately the maintenance processes of HF discharges and the electrodynamic properties of HF circuits sustaining the plasma, although the discharge and the HF field are actually coupled self-consistently. The influence of the field frequency on the properties of these plasmas is also summarized. copyright 1996 American Institute of Physics

Additional details

Publishing Information

Journal Title
AIP Conference Proceedings
Journal Volume
363
Journal Issue
1
Journal Page Range
p. 25-40.
ISSN
0094-243X
CODEN
APCPCS

Conference

Title
22. international conference on phenomena in ionized gases.
Dates
31 Jul - 4 Aug 1995.
Place
Hoboken, NJ (United States).

INIS

Country of Publication
United States
Country of Input or Organization
United States
INIS RN
28003655
Subject category
S70: PLASMA PHYSICS AND FUSION TECHNOLOGY;
Resource subtype / Literary indicator
Conference
Descriptors DEI
ARGON; DISTRIBUTION FUNCTIONS; ENERGY BALANCE; ENERGY TRANSFER; FREQUENCY DEPENDENCE; HIGH-FREQUENCY DISCHARGES; PARTICLE LOSSES; PLASMA SIMULATION; SCALING LAWS; WAVE PROPAGATION
Descriptors DEC
ELECTRIC DISCHARGES; ELEMENTS; NONMETALS; RARE GASES; SIMULATION

Optional Information

Secondary number(s)
CONF-950749--.