Surface-wave sustained plasmas: Toward a better understanding of RF and microwave discharges
- 1. Groupe de physique des plasmas, Universite de Montreal, Montreal H3C 3J7, Quebec (Canada)
- 2. Centro de Electrodinamica da Universidade Tecnica de Lisboa, Instituto Superior Tecnico, Lisboa 1000 (Portugal)
- 3. Polish Academy of Sciences, IMP-PAN, 80-952 Gdansk (Poland)
Description
An approach is presented that unifies the description of the various existing RF and microwave discharges. It is based on two essential facts: (i) it is not the spatial distribution of the high frequency (HF) electric field intensity but its spatial average that plays in the power transfer to the plasma; (ii) the power θ required to maintain an electron in the discharge is governed by charged particle losses, which are independent of the HF E-field. This enables one to model separately the maintenance processes of HF discharges and the electrodynamic properties of HF circuits sustaining the plasma, although the discharge and the HF field are actually coupled self-consistently. The influence of the field frequency on the properties of these plasmas is also summarized. copyright 1996 American Institute of Physics
Additional details
Publishing Information
- Journal Title
- AIP Conference Proceedings
- Journal Volume
- 363
- Journal Issue
- 1
- Journal Page Range
- p. 25-40.
- ISSN
- 0094-243X
- CODEN
- APCPCS
Conference
- Title
- 22. international conference on phenomena in ionized gases.
- Dates
- 31 Jul - 4 Aug 1995.
- Place
- Hoboken, NJ (United States).
INIS
- Country of Publication
- United States
- Country of Input or Organization
- United States
- INIS RN
- 28003655
- Subject category
- S70: PLASMA PHYSICS AND FUSION TECHNOLOGY;
- Resource subtype / Literary indicator
- Conference
- Descriptors DEI
- ARGON; DISTRIBUTION FUNCTIONS; ENERGY BALANCE; ENERGY TRANSFER; FREQUENCY DEPENDENCE; HIGH-FREQUENCY DISCHARGES; PARTICLE LOSSES; PLASMA SIMULATION; SCALING LAWS; WAVE PROPAGATION
- Descriptors DEC
- ELECTRIC DISCHARGES; ELEMENTS; NONMETALS; RARE GASES; SIMULATION
Optional Information
- Secondary number(s)
- CONF-950749--.