Published 2000 | Version v1
Miscellaneous

Monte Carlo Simulation of the concentration distribution of sputtered cathode material in glow discharge plasma

  • 1. Maria Sklodowska-Curie University, Institute of Physics, Lublin (Poland)

Description

no abstract available

Part of:
Abstracts of 3. International Symposium Ion Implantation and Other Applications of Ions and Electrons, ION 2000

Additional details

Publishing Information

Imprint Title
Abstracts of 3. International Symposium Ion Implantation and Other Applications of Ions and Electrons, ION 2000
Imprint Pagination
120 p.
Journal Page Range
p. 36

Conference

Title
3. International Symposium Ion Implantation and Other Applications of Ions and Electrons, ION 2000
Dates
12-15 Jun 2000
Place
Kazimierz Dolny (Poland)

INIS

Country of Publication
Poland
Country of Input or Organization
Poland
INIS RN
32030001
Subject category
S70: PLASMA PHYSICS AND FUSION TECHNOLOGY;
Resource subtype / Literary indicator
No Abstract, Conference, Non-conventional Literature
Descriptors DEI
ALUMINIUM; CATHODE SPUTTERING; COMPUTERIZED SIMULATION; GLOW DISCHARGES; LUMINESCENCE; MOLIERE THEORY; MONTE CARLO METHOD; NEON IONS; NITROGEN IONS; PLASMA; SPATIAL DISTRIBUTION; THOMAS-FERMI MODEL; TITANIUM
Descriptors DEC
ATOMIC MODELS; CALCULATION METHODS; CHARGED PARTICLES; DISTRIBUTION; ELECTRIC DISCHARGES; ELEMENTS; EMISSION; IONS; MATHEMATICAL MODELS; METALS; PHOTON EMISSION; SIMULATION; SPUTTERING; TRANSITION ELEMENTS

Optional Information