Published June 15, 2012 | Version v1
Journal article

Determination of the melting threshold of TiO2 thin films processed by excimer laser irradiation

  • 1. Chimie des Interactions Plasma-Surface, Université de Mons, 23, Place du Parc, 7000 Mons (Belgium)
  • 2. Service de Physique Théorique et Mathématique, Université de Mons, 6 Avenue du champ de Mars, 7000 Mons (Belgium)
  • 3. Materia Nova Research Center, 1 Avenue Copernic, 7000 Mons (Belgium)

Description

Processing surfaces by laser needs an understanding of the mechanisms generated by irradiation. In this work, to gain understanding of the mechanisms occurring during irradiation of TiO2 thin films by means of KrF excimer laser, we have performed infrared time resolved reflectivity measurements. This experimental investigation revealed modifications of the heating/cooling cycle as a function of the fluence (F). These modifications start appearing for a fluence value of about ∼0.25 J/cm2 which is associated with the melting threshold of the film. Additionally, we have solved numerically the heat equation of the system with specific boundary conditions. From these calculations, we have established the thermal history of the film during the 25 ns irradiation pulse. The data reveal that a part of the medium liquefies around a fluence of 0.23 J/cm2 in good agreement with the experimental data.

Additional details

Identifiers

Publishing Information

Journal Title
Journal of Applied Physics
Journal Volume
111
Journal Issue
12
Journal Page Range
p. 123108-123108.4
ISSN
0021-8979
CODEN
JAPIAU

Optional Information

Notes
(c) 2012 American Institute of Physics