Published April 1989 | Version v1
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Material parameters in a thick hydrogenated amorphous silicon detector and their effect on signal collection

Description

Transient photoconductivity and ESR measurements were done to relate the ionized dangling bond density of thick hydrogenated amorphous silicon (a-Si:H) detectors. We found that only a fraction (/approximately/30--35%) of the total defect density as measured by ESR is ionized when the detector is biased into deep depletion. The measurements on annealed samples also show that this fraction is about 0.3. An explanation based on the shift of the Fermi energy is given. The measurements show that the time dependence of relaxation is a stretched exponential. 8 refs., 4 figs., 1 tab

Availability note (English)

MF available from INIS under the Report Number; Available from NTIS, PC A02/MF A01 - OSTI; 1 as DE89012978.

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Additional details

Publishing Information

Imprint Pagination
8 p.
Report number
LBL--26997

Conference

Title
Spring meeting of the Materials Research Society.
Dates
24-28 Apr 1989.
Place
San Diego, CA (USA).

Optional Information

Notes
Portions of this document are illegible in microfiche products.
Secondary number(s)
CONF-890426--19.