Neutron activation analysis of the content of fast-diffusible impurities in especially pure reagents used in semiconductor technology

The neutron activation analysis devoid of the flame photometric analysis shortcomings is used to analyze microimpurity content in reagents. Among chemical reagents(H2O2, HCl, HNO3, especially pure water) which are often used in the semiconductor technology, the minimum content of fast-diffusible impurities is detected in nitric and muriatic acids while for example the sodium content in H2O2 is greater by order. The technique of quantitative analysis of finely dispersed microimpurity content in reaction gases with the help of especially pure Petryanov filters is proposed. High technological effectiveness os these filters in the semiconductor production is shown