Published September 25, 1987
| Version v1
Journal article
Interactions of excimer lasers with polymers
Creators
- 1. General Electric Research and Development Center, Schenectady, New York 12301
Description
Interactions of high photon energy (hν>5 eV) radiation from an excimer laser with polymeric materials has been studied. Photo-etching rates at both 193 nm and 248 nm were measured. These results, considered together with our recent measurements of the VUV optical properties of these polymers, give new insights into the mechanisms of the ablative photo-etching process
Additional details
Publishing Information
- Journal Title
- AIP Conf. Proc.
- Journal Volume
- 160
- Journal Issue
- 1
- Series
- AIP Conf. Proc.
- Journal Page Range
- 698-702
- ISSN
- 0094-243X
- CODEN
- APCPC
Conference
- Title
- OSA/APS international laser science conference.
- Dates
- 20-24 Oct 1986.
- Place
- Seattle, WA (USA).
INIS
- Country of Publication
- United States
- Country of Input or Organization
- United States
- INIS RN
- 19040182
- Subject category
- S36: MATERIALS SCIENCE;
- Resource subtype / Literary indicator
- Conference
- Descriptors DEI
- ABLATION; ETCHING; EXCIMER LASERS; LASER RADIATION; PHYSICAL RADIATION EFFECTS; POLYMERS; ULTRAVIOLET RADIATION
- Descriptors DEC
- AMPLIFIERS; ELECTROMAGNETIC RADIATION; EQUIPMENT; GAS LASERS; LASERS; RADIATION EFFECTS; RADIATIONS
Optional Information
- Secondary number(s)
- CONF-861038--.