Fractal growth mechanism of sp3-bonded 5H-BN microcones by plasma-assisted pulsed-laser chemical vapor deposition
Creators
- 1. Advanced Materials Laboratory, National Institute for Materials Science, 1-1 Namiki, Tsukuba, Ibaraki 305-0044 (Japan)
- 2. Department of Electronics, Graduate School of Information Science and Electrical Engineering, Kyushu University, Hakozaki, Fukuoka 812-8581 (Japan)
- 3. College of Engineering, Department of Materials Science, Hosei University, 3-7-2 Kajino-machi, Koganei, Tokyo 184-8584 (Japan)
Description
Here we propose a repetitive photochemical reaction and diffusion model for the fractal pattern formation of sp3-bonded 5H-BN microcones in laser-assisted plasma chemical vapor deposition, which was observed experimentally and reported previously. This model describing the behavior of the surface density of precursor species gave explanations to (1) the 'line-drawing' nature of the patterns (2) the origin of the scale-invariant self-similarity (fractality) of the pattern, and (3) the temperature-dependent uniform to fractal transition. The results have implications for controlling the self-organized arrangements of electron-emitter cones at the micro-and nanoscale by adjusting macroscopically the boundary condition (LX,LY) for the deposition, which will be very effective in improving the electron field emission properties
Additional details
Identifiers
- DOI
- 10.1063/1.2336201;
Publishing Information
- Journal Title
- Journal of Chemical Physics
- Journal Volume
- 125
- Journal Issue
- 8
- Journal Page Range
- p. 084701-084701.6
- ISSN
- 0021-9606
- CODEN
- JCPSA6
INIS
- Country of Publication
- United States
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 38032858
- Subject category
- S37: INORGANIC, ORGANIC, PHYSICAL AND ANALYTICAL CHEMISTRY; S36: MATERIALS SCIENCE; S70: PLASMA PHYSICS AND FUSION TECHNOLOGY;
- Descriptors DEI
- BORON NITRIDES; BOUNDARY CONDITIONS; CHEMICAL VAPOR DEPOSITION; DIFFUSION; ENERGY BEAM DEPOSITION; FIELD EMISSION; FRACTALS; LASER RADIATION; NANOSTRUCTURES; PHOTOCHEMICAL REACTIONS; PHOTOCHEMISTRY; PLASMA; PULSED IRRADIATION; TEMPERATURE DEPENDENCE
- Descriptors DEC
- BORON COMPOUNDS; CHEMICAL COATING; CHEMICAL REACTIONS; CHEMISTRY; DEPOSITION; ELECTROMAGNETIC RADIATION; EMISSION; IRRADIATION; NITRIDES; NITROGEN COMPOUNDS; PNICTIDES; RADIATIONS; SURFACE COATING
Optional Information
- Notes
- (c) 2006 American Institute of Physics