Published August 28, 2006 | Version v1
Journal article

Fractal growth mechanism of sp3-bonded 5H-BN microcones by plasma-assisted pulsed-laser chemical vapor deposition

  • 1. Advanced Materials Laboratory, National Institute for Materials Science, 1-1 Namiki, Tsukuba, Ibaraki 305-0044 (Japan)
  • 2. Department of Electronics, Graduate School of Information Science and Electrical Engineering, Kyushu University, Hakozaki, Fukuoka 812-8581 (Japan)
  • 3. College of Engineering, Department of Materials Science, Hosei University, 3-7-2 Kajino-machi, Koganei, Tokyo 184-8584 (Japan)

Description

Here we propose a repetitive photochemical reaction and diffusion model for the fractal pattern formation of sp3-bonded 5H-BN microcones in laser-assisted plasma chemical vapor deposition, which was observed experimentally and reported previously. This model describing the behavior of the surface density of precursor species gave explanations to (1) the 'line-drawing' nature of the patterns (2) the origin of the scale-invariant self-similarity (fractality) of the pattern, and (3) the temperature-dependent uniform to fractal transition. The results have implications for controlling the self-organized arrangements of electron-emitter cones at the micro-and nanoscale by adjusting macroscopically the boundary condition (LX,LY) for the deposition, which will be very effective in improving the electron field emission properties

Additional details

Identifiers

Publishing Information

Journal Title
Journal of Chemical Physics
Journal Volume
125
Journal Issue
8
Journal Page Range
p. 084701-084701.6
ISSN
0021-9606
CODEN
JCPSA6

Optional Information

Notes
(c) 2006 American Institute of Physics