Stress-induced breakdown during galvanostatic anodising of zirconium
Creators
- 1. Division of Materials and Process Engineering, Universite catholique de Louvain, Place Sainte-Barbe 2, B-1348 Louvain-la-Neuve (Belgium)
Description
Although internal stress is frequently being suggested as a plausible reason for oxide breakdown during valve metal anodising, no direct quantitative evidence has been made available yet. In this work, we anodized sputtered zirconium thin films galvanostatically at room temperature in sulphuric acid until breakdown was observed, and simultaneously measured the internal stress evolution in the oxide in situ, using a high-resolution curvature setup. It was found that the higher the magnitude of the observed internal compressive stress in the oxide, the smaller the oxide thickness at which breakdown occurred. The moment of breakdown was identified from a slope change in the cell voltage evolution, indicative for a decrease in anodising efficiency. The latter presumably occurs as a result of oxygen evolution, initiated by the relative increase of the cubic or tetragonal zirconia phase content relative to the monoclinic one. This was evidenced in turn by comparing electron diffractograms, taken in a transmission electron microscope, before and after breakdown. The critical role of internal stress on oxide breakdown during zirconium anodising can therefore be associated with its promoting effect on the densifying phase transformation of monoclinic oxide.
Availability note (English)
Available from http://dx.doi.org/10.1016/j.electacta.2010.03.042Additional details
Identifiers
- DOI
- 10.1016/j.electacta.2010.03.042;
- PII
- S0013-4686(10)00444-5;
Publishing Information
- Journal Title
- Electrochimica Acta
- Journal Volume
- 55
- Journal Issue
- 15
- Journal Page Range
- p. 4653-4660
- ISSN
- 0013-4686
- CODEN
- ELCAAV
INIS
- Country of Publication
- United Kingdom
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 41084904
- Subject category
- S36: MATERIALS SCIENCE;
- Descriptors DEI
- ANODIZATION; MONOCLINIC LATTICES; PHASE TRANSFORMATIONS; RESIDUAL STRESSES; SULFURIC ACID; TEMPERATURE RANGE 0273-0400 K; THIN FILMS; TRANSMISSION ELECTRON MICROSCOPY; ZIRCONIUM; ZIRCONIUM OXIDES
- Descriptors DEC
- CHALCOGENIDES; CHEMICAL COATING; CORROSION PROTECTION; CRYSTAL LATTICES; CRYSTAL STRUCTURE; DEPOSITION; ELECTROCHEMICAL COATING; ELECTROLYSIS; ELECTRON MICROSCOPY; ELEMENTS; FILMS; HYDROGEN COMPOUNDS; INORGANIC ACIDS; INORGANIC COMPOUNDS; LYSIS; METALS; MICROSCOPY; OXIDES; OXYGEN COMPOUNDS; STRESSES; SULFUR COMPOUNDS; SURFACE COATING; TEMPERATURE RANGE; TRANSITION ELEMENT COMPOUNDS; TRANSITION ELEMENTS; ZIRCONIUM COMPOUNDS
Optional Information
- Copyright
- Copyright (c) 2010 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.