Application of ion implantation to the study of electrocatalysis
- 1. Chemistry Div., Oak Ridge National Lab., Oak Ridge, TN (USA)
Description
The intent of the research described herein was to demonstrate the value of nonequilibrium surface-modification techniques (ion implantation, ion-beam mixing, etc.) for the generation and systematic study of electrocatalytically active surfaces. For this purpose, a detailed study was made of the electrocatalysis of chlorine evolution (and, to a lesser extent, oxygen evolution) at Ru-implanted titanium electrodes in aqueous media. Ru-implanted titanium near-surface alloys were generated by ion implantation of /sup 102/Ru ions into zone-refined titanium, and characterized (Ru concentration/depth profiles) by Rutherford backscattering. A judicious selection of multiple beam energies (40, 70, and 120 keV) and fluences (number of ions implanted per cm/sup 2/ of surface) at each energy enabled the generation of near-Gaussian profiles extending over a depth of approximately 100 nm and having a rather broad Ru concentration peak located at 20-40 nm from the surface. The peak Ru concentrations ranged from 1.94 x 10/sup 21/ to 1.77 x 10/sup 22/ atoms cm/sup -3/
Additional details
Publishing Information
- Publisher
- The Electrochemical Society.
- Imprint Place
- Pennington, NJ (USA)
- Imprint Title
- Proceedings of the Electrochemical Society Fall meeting: Extended abstracts. Volume 87-2
- Journal Page Range
- p. 2000.
Conference
- Title
- 172. meeting of the Electrochemical Society.
- Dates
- 18-23 Oct 1987.
- Place
- Honolulu, HI (USA).
INIS
- Country of Publication
- United States
- Country of Input or Organization
- United States
- INIS RN
- 20067417
- Subject category
- S30: DIRECT ENERGY CONVERSION; S37: INORGANIC, ORGANIC, PHYSICAL AND ANALYTICAL CHEMISTRY; S36: MATERIALS SCIENCE;
- Resource subtype / Literary indicator
- Conference
- Descriptors DEI
- BACKSCATTERING; CATALYSTS; CHLORINE; ELECTRODEPOSITION; ELECTRODES; ION IMPLANTATION; RUTHENIUM IONS; SURFACE COATING; TITANIUM ALLOYS
- Descriptors DEC
- ALLOYS; ATOMIC IONS; CHARGED PARTICLES; DEPOSITION; ELECTROLYSIS; ELEMENTS; HALOGENS; IONS; NONMETALS; SCATTERING