Published October 25, 2003 | Version v1
Journal article

Thermal stability of 1.55 μm quantum well laser structures grown by gas-source molecular beam epitaxy

Description

Full and partial InGaAsP quantum well, laser structures grown by gas source molecular beam epitaxy, have been subjected to various thermal anneal treatments. Room temperature photoluminescence has been used to measure changes in the quantum well emission wavelength. In all cases, the wavelength decreases (blue-shifts) after the anneal treatment and the details of this blue-shift with anneal time and temperature have been used to establish how specific grown in defects and defects produced through surface dissociation can be used to explain the thermally induced changes

Additional details

Identifiers

DOI
10.1016/S0921-5107;
PII
S0921510703002381;

Publishing Information

Journal Title
Materials Science and Engineering. B, Solid-State Materials for Advanced Technology
Journal Volume
103
Journal Issue
3
Journal Page Range
p. 227-232
ISSN
0921-5107
CODEN
MSBTEK

Optional Information

Copyright
Copyright (c) 2003 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.