Published June 1, 2015 | Version v1
Journal article

The Cu Based AlGaN/GaN Schottky Barrier Diode

  • 1. Engineering Research Center for Semiconductor Integrated Technology, Institute of Semiconductors, Chinese Academy of Sciences, Beijing 100083 (China)
  • 2. Semiconductor Lighting R and D Center, Chinese Academy of Sciences, Beijing 100083 (China)

Description

The electrical characteristics of Cu and Ni/Al AlGaN/GaN Schottky barrier diodes on Si substrates are compared. The onset voltage of Cu Schottky diodes is about 0.4V less than the Ni/Al contact. For the Cu/Ni Schottky contact, the leakage current is 4.7 × 10−7 A/mm at −10 V. After annealing, the leakage current is decreased to 3.7 × 10−7 A/mm for 400°C or 4.6 × 10−8 A/mm for 500°C, respectively. The electrical property is affected by the thickness ratio of Cu to Ni. The Cu/Ni for 80/20 nm shows a low onset voltage, while the Cu/Ni for 20/80 nm shows a low leakage current. Both breakdown voltages are above 720 V. (paper)

Availability note (English)

Available from http://dx.doi.org/10.1088/0256-307X/32/6/068502

Additional details

Publishing Information

Journal Title
Chinese Physics Letters
Journal Volume
32
Journal Issue
6
Journal Page Range
[3 p.]
ISSN
0256-307X
CODEN
CPLEEU