Sputter deposition and analysis of thin film Nitinol/Terfenol-D multilaminate for vibration damping
- 1. Mechanical and Aerospace Engineering Department, University of California Los Angeles, Los Angeles, CA 90095 (United States)
- 2. Fortis Technologies, Incorporated, 2249 Federal Avenue, Los Angeles, CA 90064 (United States)
Description
Nitinol/silicon laminates and Nitinol/Terfenol-D/nickel laminates were sputter deposited and characterized using x-ray diffraction (XRD), wavelength dispersive spectrometry (WDS), and a SQUID (superconducting quantum interference device). Dynamic testing showed substantial damping (tanδ) measurable in each laminate. An analytical model of a heterogeneous layered thin film damping material was also developed. Parametric studies with the analytical model illustrate the effect of combining Terfenol-D and Nitinol to create a broadband damping laminate with relatively constant tanδ for strain values between 0.05% and 1%. The model also illustrates the importance of relative stiffness on the damping of multilayer laminates, i.e. relatively high stiffness damping materials such as Terfenol-D and Nitinol may be superior to lower stiffness visco-elastics
Availability note (English)
Available from http://dx.doi.org/10.1088/0964-1726/18/1/015007Additional details
Identifiers
- DOI
- 10.1088/0964-1726/18/1/015007;
- PII
- S0964-1726(09)81417-1;
Publishing Information
- Journal Title
- Smart Materials and Structures (Print)
- Journal Volume
- 18
- Journal Issue
- 1
- Journal Page Range
- [7 p.]
- ISSN
- 0964-1726
INIS
- Country of Publication
- United Kingdom
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 44092037
- Subject category
- S36: MATERIALS SCIENCE;
- Descriptors DEI
- DAMPING; DEPOSITION; DEPOSITS; FLEXIBILITY; LAYERS; NICKEL; NICKEL ALLOYS; PARAMETRIC ANALYSIS; SILICON; SPECTROSCOPY; SPUTTERING; SQUID DEVICES; STRAINS; TESTING; THIN FILMS; TITANIUM ALLOYS; X-RAY DIFFRACTION
- Descriptors DEC
- ALLOYS; COHERENT SCATTERING; DIFFRACTION; ELECTRONIC EQUIPMENT; ELEMENTS; EQUIPMENT; FILMS; FLUXMETERS; MEASURING INSTRUMENTS; MECHANICAL PROPERTIES; METALS; MICROWAVE EQUIPMENT; SCATTERING; SEMIMETALS; SUPERCONDUCTING DEVICES; TENSILE PROPERTIES; TRANSITION ELEMENT ALLOYS; TRANSITION ELEMENTS