Published June 2006
| Version v1
Journal article
Two-dimensional atomic lithography by submicrometer focusing of atomic beams
Creators
- 1. Department of Physics, 1150 University Avenue, University of Wisconsin-Madison, Madison, Wisconsin 53706 (United States)
Description
We analyze a method for serial writing of arbitrary two-dimensional patterns using optical focusing of a collimated atomic beam. A spatial light modulator is used in a side illumination geometry to create a localized optical spot with secondary maxima that are well separated from the central peak. Numerical simulation of a lithography experiment using a magneto-optical trap as a source of cold Cs atoms, collimation and cooling in a magnetic guide, and optical focusing predicts FWHM pixel sizes of 110x110 nm and writing times of ∼20 ms/pixel
Additional details
Identifiers
Publishing Information
- Journal Title
- Journal of the Optical Society of America. Part B, Optical Physics
- Journal Volume
- 23
- Journal Issue
- 6
- Journal Page Range
- p. 1161-1169
- ISSN
- 0740-3224
- CODEN
- JOBPDE
INIS
- Country of Publication
- United States
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 37075254
- Subject category
- S71: CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSICS; S46: INSTRUMENTATION RELATED TO NUCLEAR SCIENCE AND TECHNOLOGY; S74: ATOMIC AND MOLECULAR PHYSICS;
- Descriptors DEI
- ATOMIC BEAMS; ATOMS; BEAM OPTICS; CESIUM; COOLING; FOCUSING; GEOMETRY; ILLUMINANCE; LASERS; MAGNETO-OPTICAL EFFECTS; RADIATION PRESSURE; SIMULATION; TRAPS; TWO-DIMENSIONAL CALCULATIONS; VISIBLE RADIATION
- Descriptors DEC
- ALKALI METALS; BEAMS; ELECTROMAGNETIC RADIATION; ELEMENTS; MATHEMATICS; METALS; RADIATIONS
Optional Information
- Notes
- (c) 2006 Optical Society of America