Mechanisms of carrier lifetime enhancement and conductivity-type switching on hydrogen-incorporated arsenic-doped BaSi2
- 1. Institute of Applied Physics, University of Tsukuba, Tsukuba, Ibaraki 305-8573 (Japan)
- 2. Graduate School of Engineering, Nagoya University, Nagoya, 464-8603 (Japan)
Description
Highlights: • Carrier lifetime increased in arsenic-doped BaSi2 films by hydrogen supply. • Measured carrier lifetimes were well explained by non-radiative processes. • Conductivity switching was also observed by hydrogen supply. • Localized states appeared depending on the specific configuration of a point defect. • Conductivity switching was explained by different positions of localized states. A comparative experimental and theoretical study of the role of H incorporation in As-doped BaSi2 films has been carried out based on the experimental results that an optimal time of H treatment for the increase in photoresponsivity and carrier lifetime was in the range of 1 – 20 min. Adequate theoretical representation of the decay curves in the framework of the model for non-radiative processes accounted for various trap-related recombination mechanisms to estimate the trap concentration to be in the range of 1.9 × 1013 to 1.7 × 1014 cm−3. Additionally, the extended theoretical ab initio quantum-chemical simulation of the electronic structure of the studied systems was performed. It was revealed that interstitial As atoms can mostly provide trap states in the gap while H atoms neutralize such traps. The experimentally observed unexpected switching in conductivity from n-type to p-type and vice versa in As-doped BaSi2 with H incorporation was explained to specific configurations of point defects (an As impurity with a H atom in different positions and various interatomic As-H distances) which affect the position of states in the gap.
Availability note (English)
Available from http://dx.doi.org/10.1016/j.tsf.2021.138629Additional details
Identifiers
- DOI
- 10.1016/j.tsf.2021.138629;
- PII
- S0040609021001127;
Publishing Information
- Journal Title
- Thin Solid Films (Print)
- Journal Volume
- 724
- Journal Page Range
- vp.
- ISSN
- 0040-6090
- CODEN
- THSFAP
INIS
- Country of Publication
- Switzerland
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 54002786
- Subject category
- S36: MATERIALS SCIENCE;
- Descriptors DEI
- ARSENIC; BARIUM; CARRIER LIFETIME; CONCENTRATION RATIO; DOPED MATERIALS; ELECTRONIC STRUCTURE; FILMS; IMPURITIES; INTERSTITIALS; SIMULATION; SOLAR CELLS; TRAPS
- Descriptors DEC
- ALKALINE EARTH METALS; CRYSTAL DEFECTS; CRYSTAL STRUCTURE; DIMENSIONLESS NUMBERS; DIRECT ENERGY CONVERTERS; ELEMENTS; EQUIPMENT; LIFETIME; MATERIALS; METALS; PHOTOELECTRIC CELLS; PHOTOVOLTAIC CELLS; POINT DEFECTS; SEMIMETALS; SOLAR EQUIPMENT
Optional Information
- Copyright
- Copyright (c) 2021 Elsevier B.V. All rights reserved.