As2Se3 thin films deposited by frequency assisted thermal evaporation – morphology and structure

Thin As₂Se₃ films with thicknesses of 60 and 250 nm were deposited from the initial compound by frequency assisted thermal evaporation in vacuum – a new approach for shaping thin films surface. Frequencies of 0, 50 and 4000 Hz were applied on the substrates during the deposition process. The morphology was evaluated using AFM and SEM techniques. Some main optical properties and specifics of the films were determined by the means of spectroscopic ellipsometry analysis. The structure of the samples was investigated by XRD. A possible mechanism for explanation of the observed peculiarities is proposed on the basis of the classical materials science and molecular thermodynamics. (paper)