Preparation and characterization of ultra-thin sol-gel films
- 1. Department of Inorganic and Analytical Chemistry, Hebrew University, Jerusalem, 91904 (Israel)
- 2. Department of Physical Chemistry, Israel Institute for Biological Research, Ness Ziona, 74100 (Israel)
Description
The formation and characterization of nanometer thick sol-gel films are reported. The films were prepared by spin-coating of a diluted solution of a silane precursor on a number of different substrates. The effect of dilution, rotation speed and nature of substrate on the thickness and homogeneity of the films was examined. Characterization of the films was carried out by profilometry, reflectance spectroscopy, atomic force microscopy, adhesion test and electrochemistry. We find that the dilution factor has a pronounced effect on the film thickness. Moreover, the time of dilution, namely, whether dilution was carried out before or after a period of hydrolysis, has a noticeable effect on the thickness as well as on the permeability of embedded species
Additional details
Identifiers
- DOI
- 10.1016/j.tsf.2006.11.117;
- PII
- S0040-6090(06)01499-4;
Publishing Information
- Journal Title
- Thin Solid Films
- Journal Volume
- 515
- Journal Issue
- 11
- Journal Page Range
- p. 4624-4628
- ISSN
- 0040-6090
- CODEN
- THSFAP
INIS
- Country of Publication
- Netherlands
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 39018703
- Subject category
- S36: MATERIALS SCIENCE;
- Descriptors DEI
- ADHESION; ATOMIC FORCE MICROSCOPY; DILUTION; ELECTROCHEMISTRY; HYDROLYSIS; PERMEABILITY; SILANES; SOL-GEL PROCESS; SPECTROSCOPY; SPIN-ON COATING; THIN FILMS
- Descriptors DEC
- CHEMICAL REACTIONS; CHEMISTRY; DECOMPOSITION; DEPOSITION; FILMS; HYDRIDES; HYDROGEN COMPOUNDS; LYSIS; MICROSCOPY; ORGANIC COMPOUNDS; ORGANIC SILICON COMPOUNDS; PHYSICAL PROPERTIES; SILICON COMPOUNDS; SOLVOLYSIS; SURFACE COATING
Optional Information
- Copyright
- Copyright (c) 2007 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.