The electron beam recording material containing Co(III) complex compound and 1-(2-pyridylazo)-2-naphthol

Trivalent cobalt complex compounds, [Co(NH3)6]X3, (X- = CF3COO-, H(CF2)6COO-, H(CF2)10COO-) were synthesized and the electron beam recording material (EB material) was made with a Co(III) complex compound and 1-(2-pyridylazo)-2-naphthol. Printout image was observed on the EB material which was exposed to 15 KeV electrons. Printout image was amplified to form dense image by heat development. Exposure characteristics of the EB materials were measured as a function of following parameters; accelerated electron voltage, cobalt complex concentration, an anion of cobalt complex compound, heating time, etc. The anion of the cobalt complex, H(CF2)6COO- accelerates the rate of heat development. The mechanisms of the latent image formation of the EB material, and of the heat development were proposed. (author)