Published September 2011 | Version v1
Journal article

Ultrathin TiSiN overcoat protection layer for magnetic media

  • 1. Hitachi Ltd., Hitachi Research Laboratory, 832-2 Horiguchi, Hitachinaka, Ibaraki 312-0034 (Japan)
  • 2. Hitachi Global Storage Technologies Inc., Material Laboratory at San Jose, 5601 Great Oaks Parkway, San Jose, California 95119 (United States)
  • 3. Hitachi Global Storage Technologies Inc., San Jose Research Center, 3403 Yerba Buena Road, San Jose, California 95135 (United States)

Description

TiSiN ultrathin films (10-50 A) deposited by reactive magnetron sputtering from TixSiy targets were used as anticorrosion overcoats to protect Co-containing recording media. Films' growth, structure, composition, resistance against hydrolysis, and anticorrosion performances were studied by spectroscopy (x-ray reflectivity and diffraction, ellipsometry, x-ray photoelectron spectroscopy, Fourier transform infrared reflection-absorption spectroscopy) and simulated by molecular dynamics (using modified Tersoff-type interatomic interactions). TiSiN ultrathin overcoats were found to be dense amorphous oxynitrides containing Ti-O-Si linkages. The conversion of SiNx into SiOx by hydrolysis was prevented by introducing less than 20 at. % of Ti in the films. Thanks to the formation of Ti-O-Si linkages which densify the films and reduce oxygen diffusion, good corrosion protection of the magnetic media was achieved down to 28 A TiSiN overcoat thickness.

Additional details

Identifiers

Publishing Information

Journal Title
Journal of Vacuum Science and Technology. A, International Journal Devoted to Vacuum, Surfaces, and Films
Journal Volume
29
Journal Issue
5
Journal Page Range
p. 051502-051502.11
ISSN
1553-1813

Optional Information

Notes
(c) 2011 American Vacuum Society