Ultrathin TiSiN overcoat protection layer for magnetic media
Creators
- 1. Hitachi Ltd., Hitachi Research Laboratory, 832-2 Horiguchi, Hitachinaka, Ibaraki 312-0034 (Japan)
- 2. Hitachi Global Storage Technologies Inc., Material Laboratory at San Jose, 5601 Great Oaks Parkway, San Jose, California 95119 (United States)
- 3. Hitachi Global Storage Technologies Inc., San Jose Research Center, 3403 Yerba Buena Road, San Jose, California 95135 (United States)
Description
TiSiN ultrathin films (10-50 A) deposited by reactive magnetron sputtering from TixSiy targets were used as anticorrosion overcoats to protect Co-containing recording media. Films' growth, structure, composition, resistance against hydrolysis, and anticorrosion performances were studied by spectroscopy (x-ray reflectivity and diffraction, ellipsometry, x-ray photoelectron spectroscopy, Fourier transform infrared reflection-absorption spectroscopy) and simulated by molecular dynamics (using modified Tersoff-type interatomic interactions). TiSiN ultrathin overcoats were found to be dense amorphous oxynitrides containing Ti-O-Si linkages. The conversion of SiNx into SiOx by hydrolysis was prevented by introducing less than 20 at. % of Ti in the films. Thanks to the formation of Ti-O-Si linkages which densify the films and reduce oxygen diffusion, good corrosion protection of the magnetic media was achieved down to 28 A TiSiN overcoat thickness.
Additional details
Identifiers
- DOI
- 10.1116/1.3607423;
Publishing Information
- Journal Title
- Journal of Vacuum Science and Technology. A, International Journal Devoted to Vacuum, Surfaces, and Films
- Journal Volume
- 29
- Journal Issue
- 5
- Journal Page Range
- p. 051502-051502.11
- ISSN
- 1553-1813
INIS
- Country of Publication
- United States
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 44014078
- Subject category
- S36: MATERIALS SCIENCE; S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY;
- Descriptors DEI
- ABSORPTION SPECTROSCOPY; AMORPHOUS STATE; CORROSION PROTECTION; CORROSION RESISTANCE; CRYSTAL GROWTH; ELLIPSOMETRY; FOURIER TRANSFORM SPECTROMETERS; HYDROLYSIS; MAGNETRONS; MOLECULAR DYNAMICS METHOD; OXYGEN; REFLECTIVITY; SILICON NITRIDES; SILICON OXIDES; SPUTTERING; THIN FILMS; TITANIUM SILICATES; X-RAY DIFFRACTION; X-RAY PHOTOELECTRON SPECTROSCOPY
- Descriptors DEC
- CALCULATION METHODS; CHALCOGENIDES; CHEMICAL REACTIONS; COHERENT SCATTERING; DECOMPOSITION; DIFFRACTION; ELECTRON SPECTROSCOPY; ELECTRON TUBES; ELECTRONIC EQUIPMENT; ELEMENTS; EQUIPMENT; FILMS; LYSIS; MEASURING INSTRUMENTS; MEASURING METHODS; MICROWAVE EQUIPMENT; MICROWAVE TUBES; NITRIDES; NITROGEN COMPOUNDS; NONMETALS; OPTICAL PROPERTIES; OXIDES; OXYGEN COMPOUNDS; PHOTOELECTRON SPECTROSCOPY; PHYSICAL PROPERTIES; PNICTIDES; SCATTERING; SILICATES; SILICON COMPOUNDS; SOLVOLYSIS; SPECTROMETERS; SPECTROSCOPY; SURFACE PROPERTIES; TITANIUM COMPOUNDS; TRANSITION ELEMENT COMPOUNDS
Optional Information
- Notes
- (c) 2011 American Vacuum Society