Published April 1, 2003
| Version v1
Journal article
Surface charge compensation for a highly charged ion emission microscope
Description
A surface charge compensation electron flood gun has been added to the Lawrence Livermore National Laboratory (LLNL) highly charged ion (HCI) emission microscope. HCI surface interaction results in a significant charge residue being left on the surface of insulators and semiconductors. This residual charge causes undesirable aberrations in the microscope images and a reduction of the Time-Of-Flight (TOF) mass resolution when studying the surfaces of insulators and semiconductors. The benefits and problems associated with HCI microscopy and recent results of the electron flood gun enhanced HCI microscope are discussed
Availability note (English)
Available from OSTI as DE00918097; PURL: https://www.osti.gov/servlets/purl/918097-bOee3y/Additional details
Identifiers
Publishing Information
- Journal Title
- Ultramicroscopy (Amsterdam)
- Journal Volume
- 101
- Journal Issue
- 2-4
- Journal Page Range
- vp.
- ISSN
- 0304-3991
- CODEN
- ULTRD6
INIS
- Country of Publication
- Netherlands
- Country of Input or Organization
- United States
- INIS RN
- 39105576
- Subject category
- S46: INSTRUMENTATION RELATED TO NUCLEAR SCIENCE AND TECHNOLOGY;
- Descriptors DEI
- ELECTRON GUNS; ELECTRONS; IMAGES; ION EMISSION; LAWRENCE LIVERMORE NATIONAL LABORATORY; MASS RESOLUTION; MICROSCOPES; MICROSCOPY; RESIDUES
- Descriptors DEC
- ELEMENTARY PARTICLES; EMISSION; FERMIONS; LEPTONS; NATIONAL ORGANIZATIONS; RESOLUTION; US DOE; US ORGANIZATIONS
Optional Information
- Contract/Grant/Project number
- BnR: 400403909; AC02-05CH11231
- Notes
- Journal Publication Date: 11/2004
- Secondary number(s)
- LBNL--52429