Published April 1, 2003 | Version v1
Journal article

Surface charge compensation for a highly charged ion emission microscope

Description

A surface charge compensation electron flood gun has been added to the Lawrence Livermore National Laboratory (LLNL) highly charged ion (HCI) emission microscope. HCI surface interaction results in a significant charge residue being left on the surface of insulators and semiconductors. This residual charge causes undesirable aberrations in the microscope images and a reduction of the Time-Of-Flight (TOF) mass resolution when studying the surfaces of insulators and semiconductors. The benefits and problems associated with HCI microscopy and recent results of the electron flood gun enhanced HCI microscope are discussed

Availability note (English)

Available from OSTI as DE00918097; PURL: https://www.osti.gov/servlets/purl/918097-bOee3y/

Additional details

Publishing Information

Journal Title
Ultramicroscopy (Amsterdam)
Journal Volume
101
Journal Issue
2-4
Journal Page Range
vp.
ISSN
0304-3991
CODEN
ULTRD6

Optional Information

Contract/Grant/Project number
BnR: 400403909; AC02-05CH11231
Notes
Journal Publication Date: 11/2004
Secondary number(s)
LBNL--52429