Development of atmospheric pressure glow discharge plasma assisted CVD system for the deposition of SiOx coatings

A novel, unique and self-designed radio frequency-based atmospheric pressure glow discharge plasma assisted chemical vapor deposition system (APGD-PACVD) has been developed indigenously for the deposition of SiOx coatings. The developed system has been evaluated for continuous, stable and low temperature plasma source for the deposition of adherent and uniform SiOx thin films on silicon substrates using a plasma of argon, helium and hexamethyldisiloxane (HMDSO) gases. The SiOx films deposited on silicon substrates were characterized by Fourier transform infrared spectroscopy (FTIR), field emmision scanning electron microscopy (FESEM) and energy dispersive x-ray analysis (EDXA) for confirmation of chemical structure of the coating. The results demonstrate the deposition of uniform and adherent SiOx films on silicon.