Study of artificial lattice Hf/Ni multilayer film using slow positron beam

The controlled metal multilayer film has been studied by slow positron beam and TDPAC. Hf monolayer film and Hf/Ni multilayer film were prepared. When a positron injects the sample, it is radically thermolized through the inelastic scattering. If the distribution of positron under the above conditions is represented by the depth function, it is expected usually by Makhov function. But Ghosh and Aers have investigated the implantation profile P(z,E) using Monte Carlo simulation and recently they study various kinds of monolayer and multilayer film by use of the implantation profile in the consideration of the scattering effects of positron in the interface of films. Two methods, the usual and the new method, were compared with each other in this paper. In the case of Hf 500 nm and Ni 1000 nm, the theoretical and the experimental values were agreed. On multilayer film, both values were agreed using new P(z,E) in consideration of scattering effect, but not agreed by usual P(z,E) and new P(z,E) neglected the scattering effect. To analyze the multilayer film, the scattering effect has to be considered and, moreover, the effect of nonthermalized positron is necessary to take into account near surface. (M.N.)