Published June 1995
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P-type silicon drift detectors
Description
Preliminary results on 16 CM2, position-sensitive silicon drift detectors, fabricated for the first time on p-type silicon substrates, are presented. The detectors were designed, fabricated, and tested recently at LBL and show interesting properties which make them attractive for use in future physics experiments. A pulse count rate of approximately 8 x l06 s-1 is demonstrated by the p-type silicon drift detectors. This count rate estimate is derived by measuring simultaneous tracks produced by a laser and photolithographic mask collimator that generates double tracks separated by 50 μm to 1200 μm. A new method of using ion-implanted polysilicon to produce precise valued bias resistors on the silicon drift detectors is also discussed
Availability note (English)
MF available from INIS under the Report Number; Also available from OSTI as DE96001120; NTIS; US Govt. Printing Office Dep.Files
27026296.pdf
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Additional details
Publishing Information
- Imprint Pagination
- 22 p.
- Report number
- LBL--37243
Conference
- Title
- 7. European symposium on semiconductor detectors.
- Dates
- 7-10 May 1995.
- Place
- Schloss Elmau (Germany).
INIS
- Country of Publication
- United States
- Country of Input or Organization
- United States
- INIS RN
- 27026296
- Subject category
- S46: INSTRUMENTATION RELATED TO NUCLEAR SCIENCE AND TECHNOLOGY;
- Resource subtype / Literary indicator
- Conference
- Descriptors DEI
- COUNTING RATES; DRIFT CHAMBERS; ION IMPLANTATION; P-TYPE CONDUCTORS; PARTICLE TRACKS; POSITION SENSITIVE DETECTORS; SI SEMICONDUCTOR DETECTORS
- Descriptors DEC
- MATERIALS; MEASURING INSTRUMENTS; MULTIWIRE PROPORTIONAL CHAMBERS; PROPORTIONAL COUNTERS; RADIATION DETECTORS; SEMICONDUCTOR DETECTORS; SEMICONDUCTOR MATERIALS
Optional Information
- Contract/Grant/Project number
- Contract AC03-76SF00098
- Funding organization
- USDOE, Washington, DC (United States).
- Secondary number(s)
- CONF-9505291--1.