Published June 1995 | Version v1
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P-type silicon drift detectors

Description

Preliminary results on 16 CM2, position-sensitive silicon drift detectors, fabricated for the first time on p-type silicon substrates, are presented. The detectors were designed, fabricated, and tested recently at LBL and show interesting properties which make them attractive for use in future physics experiments. A pulse count rate of approximately 8 x l06 s-1 is demonstrated by the p-type silicon drift detectors. This count rate estimate is derived by measuring simultaneous tracks produced by a laser and photolithographic mask collimator that generates double tracks separated by 50 μm to 1200 μm. A new method of using ion-implanted polysilicon to produce precise valued bias resistors on the silicon drift detectors is also discussed

Availability note (English)

MF available from INIS under the Report Number; Also available from OSTI as DE96001120; NTIS; US Govt. Printing Office Dep.

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Additional details

Publishing Information

Imprint Pagination
22 p.
Report number
LBL--37243

Conference

Title
7. European symposium on semiconductor detectors.
Dates
7-10 May 1995.
Place
Schloss Elmau (Germany).

Optional Information

Contract/Grant/Project number
Contract AC03-76SF00098
Funding organization
USDOE, Washington, DC (United States).
Secondary number(s)
CONF-9505291--1.