Preparation of mesoporous silica films SBA-15 over different substrates
Creators
- 1. Centro de Desenvolvimento da Tecnologia Nuclear (CDTN/CNEN-MG), Belo Horizonte, MG (Brazil). Servico de Nanotecnologia
Description
Mesoporous materials have been target of frequent interest due to its wide application possibilities, for example development of gas sensors, catalysis, molecules transportation, pharmaceuticals release, synthesis of auto-organized nanostructures, among others. The possibilities of application are enhanced when such materials are disposed in the form of thin and ultrathin films. In this work the preparation of mesoporous SBA-15 silica films is explored by means of the dipcoating technique of a sol-gel on different substrates (glass slides, stainless steel, copper), using the surfactant poly(ethylene glycol)-block-poly(propylene glycol)- block-poly(ethylene glycol), known as P123, a block copolymer. Synthesis parameters surfactant concentration, aging time and temperature were investigated. In this work we present the morphological and structural characterization of the prepared films, which were obtained using atomic force microscopy and x-ray fluorescence and diffraction. (author)
Files
42050107.pdf
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Additional details
Additional titles
- Original title (Portuguese)
- Preparacao de filmes de silica mesoporosa SBA-15 sobre diferentes substratos
Publishing Information
- Imprint Pagination
- 7 p.
- Report number
- INIS-BR--9053
Conference
- Title
- Brazilian congress on engineering and materials science
- Original Conference Title
- 19. CBECIMAT: Congresso brasileiro de engenharia e ciencia dos materiais
- Acronym
- 19. CBECIMAT
- Dates
- 21-25 Nov 2010
- Place
- Campos do Jordao, SP (Brazil)
INIS
- Country of Publication
- Brazil
- Country of Input or Organization
- Brazil
- INIS RN
- 42050107
- Subject category
- S36: MATERIALS SCIENCE; S37: INORGANIC, ORGANIC, PHYSICAL AND ANALYTICAL CHEMISTRY;
- Resource subtype / Literary indicator
- Conference
- Descriptors DEI
- AGING; ATOMIC FORCE MICROSCOPY; COATINGS; CONFIGURATION; CRYSTAL STRUCTURE; CRYSTALLOGRAPHY; DIFFUSE SCATTERING; DIP COATING; DIPPED COATINGS; FLUORESCENCE; FLUORESCENCE SPECTROSCOPY; MORPHOLOGY; QUANTITATIVE CHEMICAL ANALYSIS; SCANNING TUNNELING MICROSCOPY; SILICON; SILICON OXIDES; STRUCTURAL CHEMICAL ANALYSIS; STRUCTURAL MODELS; SUBSTRATES; SURFACTANTS; THIN FILMS; X RADIATION; X-RAY DIFFRACTION; X-RAY FLUORESCENCE ANALYSIS
- Descriptors DEC
- CHALCOGENIDES; CHEMICAL ANALYSIS; COATINGS; COHERENT SCATTERING; DEPOSITION; DIFFRACTION; ELECTROMAGNETIC RADIATION; ELEMENTS; EMISSION; EMISSION SPECTROSCOPY; FILMS; IONIZING RADIATIONS; LUMINESCENCE; MICROSCOPY; NONDESTRUCTIVE ANALYSIS; OXIDES; OXYGEN COMPOUNDS; PHOTON EMISSION; RADIATIONS; SCATTERING; SEMIMETALS; SILICON COMPOUNDS; SPECTROSCOPY; SURFACE COATING; X-RAY EMISSION ANALYSIS
Optional Information
- Notes
- Code: 213-049.pdf